Characterization of ordered mesoporous films on silicon (001) surface using X-ray and electron diffraction

• Published in: Journal of applied crystallography 2005-02, Vol.38 (1), p.211-216
• Main Authors: Liu, Pang-Hung, Chao, Kuei-Jung, Guo, Xing-Jian, Huang, Kuo-Ying, Lee, Yen-Ru, Cheng, Cheng-Wen, Chiu, Mau-Sen, Chang, Shih-Lin
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; grazing incidence X-ray diffraction; mesoporous silica; Physics; Single-crystal and powder diffraction; Structure and morphology; thickness; Structure of solids and liquids; crystallography; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; thin films; transmission electron microscopy; X-ray diffraction and scattering
• ISSN: 1600-5767; 0021-8898; 1600-5767
• DOI: 10.1107/S0021889804031498

A continuous silica film with well aligned mesochannels parallel to the Si(001) surface was found to be formed through sol–gel dip‐coating of a silica precursor with nonionic ethylene oxide surfactant. Two two‐dimensional mesoporous structures in centered and non‐centered rectangular symmetries and with the short axes of elongated ellipsoidal pores normal to the surface were observed by X‐ray and electron diffraction. Detailed transmission electron microscopy investigations were employed to view the direction dependence of the channel or pore packing in the continuous film.