A control system for photolithographic sequences

The goal of our control system is to improve the reliability, accuracy, and economy of operation of a sequence of interrelated processes. We achieve this task by using well known, rigorous statistical techniques to continuously monitor process parameters, detect out-of-control equipment, and then op...

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Bibliographic Details
Published in:IEEE transactions on semiconductor manufacturing 1996-05, Vol.9 (2), p.191-207
Main Authors: Sovarong Leang, Shang-Yi Ma, Thomson, J., Bombay, B.J., Spanos, C.J.
Format: Article
Language:English
Subjects:
Applied sciences
Automatic control
Condition monitoring
Control systems
Electronics
Exact sciences and technology
Feedback
Feedforward systems
Laboratories
Lithography
Manufacturing automation
Microelectronic fabrication (materials and surfaces technology)
Process control
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Supervisory control
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Summary:The goal of our control system is to improve the reliability, accuracy, and economy of operation of a sequence of interrelated processes. We achieve this task by using well known, rigorous statistical techniques to continuously monitor process parameters, detect out-of-control equipment, and then optimally adjust relevant machine inputs to bring the process back on target We have implemented the supervisory control system on the photolithography sequence in the Berkeley Microfabrication Laboratory, where it has been conclusively proven that the supervisory control system increases significantly the capability of the entire process. The supervisory control algorithms, consisting of feedback and feed-forward control, multivariate, model-based statistical process control (SPC), and automated specification management algorithms, are independent of machine and/or process, and can be applied to any semiconductor manufacturing sequence.
ISSN:0894-6507
1558-2345
DOI:10.1109/66.492813