Energy dependence of the carbon plasma beam on the arc voltage and the anode-cathode distance in the pulsed arc discharge method

The energies of the carbon plasma beams produced by the pulsed arc discharge method have been measured as a function of the arc voltage (1500-4000 V) and anode-cathode distance. The energies were determined by using the electro-optical time-of-flight method. The energy of the plasma rises steeply wh...

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Bibliographic Details
Published in:Diamond and related materials 2005-09, Vol.14 (9), p.1451-1454
Main Authors: ALAKOSKI, Esa, TIAINEN, Veli-Matti
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Theory and models of film growth
Vapor phase epitaxy
growth from vapor phase
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Summary:The energies of the carbon plasma beams produced by the pulsed arc discharge method have been measured as a function of the arc voltage (1500-4000 V) and anode-cathode distance. The energies were determined by using the electro-optical time-of-flight method. The energy of the plasma rises steeply when the anode-cathode distance and voltage are increased. The anode-cathode distance varied from 0.6 to 4.6 cm and the plasma ion energies from 20 to 730 eV, respectively. The discharge voltage of 4000 V and distance of 4.6 cm were necessary for the plasma ion energy of 730 eV. The practical significance of highly energetic carbon plasma for the preparation of the adhesion layer of high-quality amorphous diamond-like carbon (DLC) protective coatings is presented.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2005.02.012