Copper–vanadium mixed oxide thin film electrodes

In this work, small amounts of vanadium atoms were incorporated in copper oxide films in order to decrease the charge capacity loss during the electrochemical lithium reaction, mainly in the first cycle. Reactive sputtering was the film deposition technique used to deposit pure copper oxide films, C...

Full description

Saved in:
Bibliographic Details
Published in:Journal of power sources 2006-11, Vol.162 (1), p.679-684
Main Authors: Souza, E.A., dos Santos, A.O., Cardoso, L.P., Tabacniks, M.H., Landers, R., Gorenstein, A.
Format: Article
Language:English
Subjects:
Applied sciences
Copper oxide
Direct energy conversion and energy accumulation
Electrical engineering. Electrical power engineering
Electrical power engineering
Electrochemical conversion: primary and secondary batteries, fuel cells
Electrode
Exact sciences and technology
Microbatteries
Reactive sputtering
Thin films
Vanadium
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:In this work, small amounts of vanadium atoms were incorporated in copper oxide films in order to decrease the charge capacity loss during the electrochemical lithium reaction, mainly in the first cycle. Reactive sputtering was the film deposition technique used to deposit pure copper oxide films, CuO, and copper–vanadium mixed oxides CuO(VO y ). The composition, oxidation state and crystallinity of the deposited films were investigated. Electrochemical studies were performed, and the results demonstrated that the mixed oxides have a better electrochemical behavior with a higher capacity and stability in the charge/discharge processes, when compared to the pure CuO films behavior.
ISSN:0378-7753
1873-2755
DOI:10.1016/j.jpowsour.2006.07.011