Fabrication of refractive X-ray focusing lenses by deep X-ray lithography

This report describes the fabrication process by deep X-ray lithography of a new type of hard X-ray lens made of stacks of identical prisms with dimensions in the 10–20 μm range. The size deviations of the structural dimensions are evaluated for lenses fabricated in PMMA and SU-8 polymer materials....

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Bibliographic Details
Published in:Microelectronic engineering 2005-03, Vol.78, p.79-87
Main Authors: Pérennès, F., Matteucci, M., Jark, W., Marmiroli, B.
Format: Article
Language:English
Subjects:
Applied sciences
Cyclic accelerators and storage rings
Deep X-ray lithography
Electronics
Exact sciences and technology
Experimental methods and instrumentation for elementary-particle and nuclear physics
Fresnel X-ray lenses
Microelectronic fabrication (materials and surfaces technology)
Nuclear physics
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Synchrotrons
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Summary:This report describes the fabrication process by deep X-ray lithography of a new type of hard X-ray lens made of stacks of identical prisms with dimensions in the 10–20 μm range. The size deviations of the structural dimensions are evaluated for lenses fabricated in PMMA and SU-8 polymer materials. Radiographs taken on a synchrotron allows the measurement of the prism etched depth showing that the focusing quality is directly correlated with the quality of the etching. Finally the technological process parameters are optimized to achieve aspect ratio of 25:1.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2004.12.012