Loading…

Effects of tetraethoxysilane vapor treatment on the cetyltrimethylammonium bromide-templated silica mesoporous low-k thin film with 3D close-packed array of spherical pores

Cetyltrimethylammonium bromide (CTAB) templated mesoporous silica thin films were deposited on silicon substrate by evaporation-induced self-assembly (EISA) process using a spin coating method. The identification of mesophase with P63/mmc space group was confirmed by using an X-ray diffraction (XRD)...

Full description

Saved in:
Bibliographic Details
Published in:Applied surface science 2004-10, Vol.237 (1-4), p.405-410
Main Authors: Han, Choo-Kyung, Jung, Sang-Bae, Park, Hyung-Ho
Format: Article
Language:English
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites
container_end_page 410
container_issue 1-4
container_start_page 405
container_title Applied surface science
container_volume 237
creator Han, Choo-Kyung
Jung, Sang-Bae
Park, Hyung-Ho
description Cetyltrimethylammonium bromide (CTAB) templated mesoporous silica thin films were deposited on silicon substrate by evaporation-induced self-assembly (EISA) process using a spin coating method. The identification of mesophase with P63/mmc space group was confirmed by using an X-ray diffraction (XRD) technique in Bragg–Brentano geometry along with the reported phase diagram. The determination of optimized spinning time was discussed and it was found that the mesophase formation in dynamic conditions during EISA is more important for the final mesophase formation rather than the modulable steady state. Tetraethoxysilane (TEOS) vapor treatment was conducted to improve the framework stability during calcination and reduce silanol in the framework. XRD patterns and Fourier transformed infrared spectra confirmed that the TEOS vapor treated samples have a strengthened framework and increased hydrophobicity showing the improved leakage current behavior, which suggests its potential application to intermetal dielectric.
doi_str_mv 10.1016/j.apsusc.2004.06.035
format article
fullrecord <record><control><sourceid>proquest_elsev</sourceid><recordid>TN_cdi_proquest_miscellaneous_29244988</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0169433204009791</els_id><sourcerecordid>28183021</sourcerecordid><originalsourceid>FETCH-LOGICAL-e202t-54740cef4f8f161904f25df8791cad84602e7bbae159054a3bffe73e7a063a973</originalsourceid><addsrcrecordid>eNqFkbuOFDEQRS0EEsPCHxA4IuvGr-52J0hoWR7SSiQQWzXussazdruxPbvMP_GReDTkRA7q1FH5XkLectZzxsf3xx62ciq2F4ypno09k8MzsuN6kt0waPWc7Bo2d0pK8ZK8KuXIGBdtuiN_7pxDWwtNjlasGbAe0u9z8QFWpI-wpUxrRqgR10rTSusBqcV6DjX72OBzgBjT6k-R7nOKfsGuYtwCVFxo03gLNGJJTZROhYb01D00iV-p8yHSJ18PVH6iNqSC3Qb2oa1BznC-XFS2A-ZmCLStY3lNXjgIBd_8e2_Iz893P26_dvffv3y7_XjfoWCidoOaFLPolNOOj3xmyolhcXqauYVFq5EJnPZ7QD7MbFAg9y2DSeIEbJQwT_KGvLt6t5x-nbBUE32xGC6ZtE8YMQulZq3_D2quJRO8gR-uILazHz1mU6zH1eLic4vfLMkbzsylTXM01zbNpU3DRtPalH8BlEGbVQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28183021</pqid></control><display><type>article</type><title>Effects of tetraethoxysilane vapor treatment on the cetyltrimethylammonium bromide-templated silica mesoporous low-k thin film with 3D close-packed array of spherical pores</title><source>ScienceDirect Freedom Collection 2022-2024</source><creator>Han, Choo-Kyung ; Jung, Sang-Bae ; Park, Hyung-Ho</creator><creatorcontrib>Han, Choo-Kyung ; Jung, Sang-Bae ; Park, Hyung-Ho</creatorcontrib><description>Cetyltrimethylammonium bromide (CTAB) templated mesoporous silica thin films were deposited on silicon substrate by evaporation-induced self-assembly (EISA) process using a spin coating method. The identification of mesophase with P63/mmc space group was confirmed by using an X-ray diffraction (XRD) technique in Bragg–Brentano geometry along with the reported phase diagram. The determination of optimized spinning time was discussed and it was found that the mesophase formation in dynamic conditions during EISA is more important for the final mesophase formation rather than the modulable steady state. Tetraethoxysilane (TEOS) vapor treatment was conducted to improve the framework stability during calcination and reduce silanol in the framework. XRD patterns and Fourier transformed infrared spectra confirmed that the TEOS vapor treated samples have a strengthened framework and increased hydrophobicity showing the improved leakage current behavior, which suggests its potential application to intermetal dielectric.</description><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><identifier>DOI: 10.1016/j.apsusc.2004.06.035</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>CTAB ; EISA ; Low dielectric ; Mesoporous material ; Spin coating ; TEOS vapor treatment</subject><ispartof>Applied surface science, 2004-10, Vol.237 (1-4), p.405-410</ispartof><rights>2004 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Han, Choo-Kyung</creatorcontrib><creatorcontrib>Jung, Sang-Bae</creatorcontrib><creatorcontrib>Park, Hyung-Ho</creatorcontrib><title>Effects of tetraethoxysilane vapor treatment on the cetyltrimethylammonium bromide-templated silica mesoporous low-k thin film with 3D close-packed array of spherical pores</title><title>Applied surface science</title><description>Cetyltrimethylammonium bromide (CTAB) templated mesoporous silica thin films were deposited on silicon substrate by evaporation-induced self-assembly (EISA) process using a spin coating method. The identification of mesophase with P63/mmc space group was confirmed by using an X-ray diffraction (XRD) technique in Bragg–Brentano geometry along with the reported phase diagram. The determination of optimized spinning time was discussed and it was found that the mesophase formation in dynamic conditions during EISA is more important for the final mesophase formation rather than the modulable steady state. Tetraethoxysilane (TEOS) vapor treatment was conducted to improve the framework stability during calcination and reduce silanol in the framework. XRD patterns and Fourier transformed infrared spectra confirmed that the TEOS vapor treated samples have a strengthened framework and increased hydrophobicity showing the improved leakage current behavior, which suggests its potential application to intermetal dielectric.</description><subject>CTAB</subject><subject>EISA</subject><subject>Low dielectric</subject><subject>Mesoporous material</subject><subject>Spin coating</subject><subject>TEOS vapor treatment</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNqFkbuOFDEQRS0EEsPCHxA4IuvGr-52J0hoWR7SSiQQWzXussazdruxPbvMP_GReDTkRA7q1FH5XkLectZzxsf3xx62ciq2F4ypno09k8MzsuN6kt0waPWc7Bo2d0pK8ZK8KuXIGBdtuiN_7pxDWwtNjlasGbAe0u9z8QFWpI-wpUxrRqgR10rTSusBqcV6DjX72OBzgBjT6k-R7nOKfsGuYtwCVFxo03gLNGJJTZROhYb01D00iV-p8yHSJ18PVH6iNqSC3Qb2oa1BznC-XFS2A-ZmCLStY3lNXjgIBd_8e2_Iz893P26_dvffv3y7_XjfoWCidoOaFLPolNOOj3xmyolhcXqauYVFq5EJnPZ7QD7MbFAg9y2DSeIEbJQwT_KGvLt6t5x-nbBUE32xGC6ZtE8YMQulZq3_D2quJRO8gR-uILazHz1mU6zH1eLic4vfLMkbzsylTXM01zbNpU3DRtPalH8BlEGbVQ</recordid><startdate>20041015</startdate><enddate>20041015</enddate><creator>Han, Choo-Kyung</creator><creator>Jung, Sang-Bae</creator><creator>Park, Hyung-Ho</creator><general>Elsevier B.V</general><scope>7QQ</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope><scope>7TB</scope><scope>FR3</scope></search><sort><creationdate>20041015</creationdate><title>Effects of tetraethoxysilane vapor treatment on the cetyltrimethylammonium bromide-templated silica mesoporous low-k thin film with 3D close-packed array of spherical pores</title><author>Han, Choo-Kyung ; Jung, Sang-Bae ; Park, Hyung-Ho</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-e202t-54740cef4f8f161904f25df8791cad84602e7bbae159054a3bffe73e7a063a973</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>CTAB</topic><topic>EISA</topic><topic>Low dielectric</topic><topic>Mesoporous material</topic><topic>Spin coating</topic><topic>TEOS vapor treatment</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Han, Choo-Kyung</creatorcontrib><creatorcontrib>Jung, Sang-Bae</creatorcontrib><creatorcontrib>Park, Hyung-Ho</creatorcontrib><collection>Ceramic Abstracts</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Mechanical &amp; Transportation Engineering Abstracts</collection><collection>Engineering Research Database</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Han, Choo-Kyung</au><au>Jung, Sang-Bae</au><au>Park, Hyung-Ho</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of tetraethoxysilane vapor treatment on the cetyltrimethylammonium bromide-templated silica mesoporous low-k thin film with 3D close-packed array of spherical pores</atitle><jtitle>Applied surface science</jtitle><date>2004-10-15</date><risdate>2004</risdate><volume>237</volume><issue>1-4</issue><spage>405</spage><epage>410</epage><pages>405-410</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><abstract>Cetyltrimethylammonium bromide (CTAB) templated mesoporous silica thin films were deposited on silicon substrate by evaporation-induced self-assembly (EISA) process using a spin coating method. The identification of mesophase with P63/mmc space group was confirmed by using an X-ray diffraction (XRD) technique in Bragg–Brentano geometry along with the reported phase diagram. The determination of optimized spinning time was discussed and it was found that the mesophase formation in dynamic conditions during EISA is more important for the final mesophase formation rather than the modulable steady state. Tetraethoxysilane (TEOS) vapor treatment was conducted to improve the framework stability during calcination and reduce silanol in the framework. XRD patterns and Fourier transformed infrared spectra confirmed that the TEOS vapor treated samples have a strengthened framework and increased hydrophobicity showing the improved leakage current behavior, which suggests its potential application to intermetal dielectric.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2004.06.035</doi><tpages>6</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0169-4332
ispartof Applied surface science, 2004-10, Vol.237 (1-4), p.405-410
issn 0169-4332
1873-5584
language eng
recordid cdi_proquest_miscellaneous_29244988
source ScienceDirect Freedom Collection 2022-2024
subjects CTAB
EISA
Low dielectric
Mesoporous material
Spin coating
TEOS vapor treatment
title Effects of tetraethoxysilane vapor treatment on the cetyltrimethylammonium bromide-templated silica mesoporous low-k thin film with 3D close-packed array of spherical pores
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T08%3A19%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_elsev&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effects%20of%20tetraethoxysilane%20vapor%20treatment%20on%20the%20cetyltrimethylammonium%20bromide-templated%20silica%20mesoporous%20low-k%20thin%20film%20with%203D%20close-packed%20array%20of%20spherical%20pores&rft.jtitle=Applied%20surface%20science&rft.au=Han,%20Choo-Kyung&rft.date=2004-10-15&rft.volume=237&rft.issue=1-4&rft.spage=405&rft.epage=410&rft.pages=405-410&rft.issn=0169-4332&rft.eissn=1873-5584&rft_id=info:doi/10.1016/j.apsusc.2004.06.035&rft_dat=%3Cproquest_elsev%3E28183021%3C/proquest_elsev%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-e202t-54740cef4f8f161904f25df8791cad84602e7bbae159054a3bffe73e7a063a973%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=28183021&rft_id=info:pmid/&rfr_iscdi=true