Application of glow discharge butadiene coatings on plasticized cornstarch substrates

In the present work, cast thermoplastic starch films were successfully modified by plasma of 1,3-butadiene to reduce water sensitivity. To overcome the difficulties involved in plasma coating of substrates with high water content, high base pressure was used before the introduction of the working ga...

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Bibliographic Details
Published in:Thin solid films 2006-12, Vol.515 (4), p.1714-1720
Main Authors: Simão, R.A., Thiré, R.M.S.M., Coutinho, P.R., de Araújo, P.J.G., Achete, C.A., Andrade, C.T.
Format: Article
Language:English
Subjects:
Atomic force microscopy (AFM)
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Electric discharges
Exact sciences and technology
Glow
corona
Ion and electron beam-assisted deposition
ion plating
Materials science
Mechanical and acoustical properties
Methods of deposition of films and coatings
film growth and epitaxy
Physical properties of thin films, nonelectronic
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Plasma processing and deposition
Plasma-based ion implantation and deposition
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thermoplastic starch
Wetting
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Summary:In the present work, cast thermoplastic starch films were successfully modified by plasma of 1,3-butadiene to reduce water sensitivity. To overcome the difficulties involved in plasma coating of substrates with high water content, high base pressure was used before the introduction of the working gas and mild deposition parameters were employed. The coatings produced at 6 Pa base pressure were smooth, oxygen free and presented low internal stress. After being coated under these mild conditions, cornstarch films were submitted to wettability measurements and atomic force microscopy (AFM) morphological evaluation. Results showed that the coating process improved significantly the cornstarch films' physical properties; water absorption was reduced up to 80%, while water contact angle increased more than 100%. AFM images indicated that the produced coatings cover homogeneously all the different regions of the cornstarch film.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2006.06.013