Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe

We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave character...

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Bibliographic Details
Published in:Key engineering materials 2006-01, Vol.321-323, p.1457-1460
Main Authors: Babajayan, Arsen, Lee, Kie Jin, Yoo, Hyun Jun, Kim, Jong Chel, Kim, Song Hui
Format: Article
Language:English
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Summary:We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave characterization, the surface resistance dependence of the metallic thin films has been mapped nondestructively.
ISSN:1013-9826
1662-9795
1662-9795
DOI:10.4028/www.scientific.net/KEM.321-323.1457