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Growth and characterization of GaN-based structures on SiCOI-engineered substrates
Silicon carbide (SiC) still shows the best properties as substrate for the growth of GaN and its alloys but suffers from a very high price. An innovative alternative for this substrate are SiC/SiO 2/Si (SiCOI) substrates, combining SiC and Si (silicon) substrate advantages thanks to the Smart Cut™ t...
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Published in: | Journal of crystal growth 2004-12, Vol.272 (1), p.500-505 |
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Main Authors: | , , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Silicon carbide (SiC) still shows the best properties as substrate for the growth of GaN and its alloys but suffers from a very high price. An innovative alternative for this substrate are SiC/SiO
2/Si (SiCOI) substrates, combining SiC and Si (silicon) substrate advantages thanks to the Smart Cut™ technology. These substrates consist of thin SiC layers (∼270
nm) bonded on (0
0
1) Si substrates. Using SiCOI substrates, up to 3
μm of GaN could be grown crack-free. The structures were investigated by atomic force microscopy (root mean square=0.86
nm), high-resolution X-ray diffraction and low-temperature (20
K) photoluminescence (PL) (FWHM (full-width at half-maximum)=4.9
meV). Electroluminescence test heterostructures consisting of InGaN/GaN multiple quantum wells (MQWs) were also deposited on SiCOI. Room temperature PL measurements resulted in a QW emission at around 440
nm with a FWHM of 7.8
nm. At electrical excitation, blue light emission was observed. |
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ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/j.jcrysgro.2004.08.037 |