KrF laser deposition combined with magnetron sputtering to grow titanium–carbide layers

Titanium–carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films' properties were characterized...

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Bibliographic Details
Published in:Thin solid films 2006-05, Vol.506 (Complete), p.101-105
Main Authors: Jelínek, M., Kocourek, T., Kadlec, J., Vorlíček, V., Čerňanský, M., Studnička, V., Santoni, A., Boháč, P., Uherek, F.
Format: Article
Language:English
Subjects:
Hybrid deposition
Magnetron sputtering
PLD
TiC film
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Summary:Titanium–carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films' properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesion and microhardness were also studied. Crystalline TiC films were fabricated at room temperature.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2005.08.040