Hot embossing of micrographic elements in polypropylene

Micrographic features generated by electron beam lithography have been hot embossed in biaxially-oriented polypropylene (BOPP). Each micrographic element consisted of a sub-field of 30 × 30 μm with a specific configuration of symbols, lettering and graphics. The micrographic elements were integrated...

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Bibliographic Details
Published in:Microelectronic engineering 2007, Vol.84 (1), p.109-113
Main Authors: Leech, Patrick W., Lee, Robert A., Sexton, Brett A., Smith, Fiona
Format: Article
Language:English
Subjects:
Applied sciences
BOPP
Electronics
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Gratings
Hot embossing
Microelectronic fabrication (materials and surfaces technology)
Micrographic
Optical elements, devices, and systems
Optics
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:Micrographic features generated by electron beam lithography have been hot embossed in biaxially-oriented polypropylene (BOPP). Each micrographic element consisted of a sub-field of 30 × 30 μm with a specific configuration of symbols, lettering and graphics. The micrographic elements were integrated with arrays of diffractive gratings in the form of an optically variable device. A high quality embossing of various micrographic elements has been demonstrated in features with a linewidth dimension ⩾365 nm and depth ⩾255 nm. The replication of arrays of micrographic elements was achieved uniformly over an area of 20 × 20 mm in the BOPP film by embossing at a temperature of 130 °C.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2006.08.010