Low energy electron beam microcolumn lithography

A compact sized low energy microcolumn system has been developed for mask-less lithography application. The microcolumn has high throughput capabilities as well as high resolution using arrayed microcolumn structures. A number of arrayed microcolumn structures have been studied based on single colum...

Full description

Saved in:
Bibliographic Details
Published in:Microelectronic engineering 2006-04, Vol.83 (4), p.962-967
Main Authors: Kim, Ho Seob, Kim, Young Chul, Kim, Dae-Wook, Ahn, Seung Joon, Jang, Yong, Kim, Hyung Woo, Seong, Do Jin, Park, Kyoung Wan, Park, Seong Soon, Kim, Byung Jin
Format: Article
Language:English
Subjects:
Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Low energy electron beam
Maskless e-beam lithography
Microcolumn
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A compact sized low energy microcolumn system has been developed for mask-less lithography application. The microcolumn has high throughput capabilities as well as high resolution using arrayed microcolumn structures. A number of arrayed microcolumn structures have been studied based on single column modules, monolithic column module, and wafer-scale column module. In this paper, a review of microcolumn studies and recent results of sub-60 nm line patterning in advanced low energy microcolumn operation is presented.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2006.01.099