Influence of morphology of catalyst thin film on vertically aligned carbon nanotube growth

• Published in: Journal of crystal growth 2004-10, Vol.271 (1-2), p.81-89
• Main Authors: Min Shin, Young, Yol Jeong, Seung, Jin Jeong, Hee, Jin Eum, Sung, Woong Yang, Cheol, Yun Park, Chong, Hee Lee, Young
• Format: Article
• Language: English
• Subjects: A1. Growth models; A3. Chemical vapor deposition processes; B1. Nanomaterials; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Nanoscale materials and structures: fabrication and characterization; Nanotubes; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/j.jcrysgro.2004.07.028

We have investigated how the morphology of transition metals prepared by radio-frequency magnetron sputtering influences on the vertically aligned carbon nanotube growth during thermal chemical vapor deposition (CVD). By changing the catalyst morphology systematically with sputtering temperature, pressure, and time, we were able to control the density, diameter, and length of the aligned carbon nanotubes at a given thermal CVD growth condition. We found that the sputtering temperature and pressure determine the grain size and density of the transition metals that control the diameter, length, and density of carbon nanotubes. Formation mechanism of nucleation seeds for carbon nanotubes in terms of these variables is further discussed.