NEMS fabrication of metal coated sub-wavelength size aperture array and its optical characterization

• Published in: Thin solid films 2006-05, Vol.506 (Complete), p.225-229
• Main Authors: Kim, J.W., Moon, J.-S., Kim, D.W., Jung, M.Y., Ok, J.T., Choi, S.S., Lim, H.J., Yang, J.S., Boo, J.-H.
• Format: Article
• Language: English
• Subjects: Aperture array; MEMS; MERIE system; NEMS; Sub-wavelength
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2005.08.349

We successfully fabricated the sub-wavelength size silicon oxide aperture array as a near-field optical probe in order to examine the possible light resonance-tunneling phenomenon. Initially, using a magnetic enhanced reactive ion etching (MERIE) system, a (50 × 50) array of the (5 × 5) m 2 size patterns was fabricated on the silicon wafer followed by V-groove formation using alkaline solution Si bulk micromachining. The silicon oxide aperture array with sub-wavelength size was revealed after the water-diluted HF acid etching. The nano-size aperture on the top of the pyramidal array with an opening rate of ∼ 27 nm/min was carefully controlled with (50:1) water-diluted HF acid solution. The Al thin film was thermally evaporated on the (50 × 50) array pattern and for sub wavelength size aperture fabrication. The initial diameter greater than 300 nm of the aperture was reduced down to ∼ 100 nm. The far-field diffraction pattern was clearly observed. The optical intensity revealed the extra-ordinary amounts of the light transmission through the nano-aperture array.