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Nanofabrication of protein-patterned substrates for future cell adhesion experiments
A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO 2. The SiO 2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches...
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| Published in: | Microelectronic engineering 2005-03, Vol.78, p.582-586 |
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| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
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| cited_by | cdi_FETCH-LOGICAL-c401t-ea1854f348486a4656cf6d20b34ebbe06dc71c7cdd0f7ebb73a5248eff31d3dd3 |
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| cites | cdi_FETCH-LOGICAL-c401t-ea1854f348486a4656cf6d20b34ebbe06dc71c7cdd0f7ebb73a5248eff31d3dd3 |
| container_end_page | 586 |
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| container_start_page | 582 |
| container_title | Microelectronic engineering |
| container_volume | 78 |
| creator | Künzi, P.A. Lussi, J. Aeschimann, L. Danuser, G. Textor, M. de Rooij, N.F. Staufer, U. |
| description | A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO
2. The SiO
2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-
l-lysine-
g-poly(ethylene glycol) was used to passivate the surrounding SiO
2 against protein adsorption. The effectiveness of the process was investigated by fluorescent microscopy and scanning near-field optical microscopy on substrates which have been exposed to fluorescently labeled streptavidin. |
| doi_str_mv | 10.1016/j.mee.2004.12.073 |
| format | article |
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2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-
l-lysine-
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2. The SiO
2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-
l-lysine-
g-poly(ethylene glycol) was used to passivate the surrounding SiO
2 against protein adsorption. The effectiveness of the process was investigated by fluorescent microscopy and scanning near-field optical microscopy on substrates which have been exposed to fluorescently labeled streptavidin.</description><subject>Biological and medical sciences</subject><subject>Biotechnology</subject><subject>Electron beam lithography</subject><subject>Fundamental and applied biological sciences. Psychology</subject><subject>Indium-tin-oxide</subject><subject>Methods. Procedures. Technologies</subject><subject>Nanofabrication</subject><subject>Others</subject><subject>Protein adsorption</subject><subject>Protein patterning</subject><subject>Self-assembling</subject><subject>Various methods and equipments</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouH78AG-96K01adKkiydZ_IJFL-s5pMkEs3SbmqSi_96UXfDmaZjheWfeeRG6IrgimPDbbbUDqGqMWUXqCgt6hBakFbRsGt4eo0VmRLmkRJyisxi3OPcMtwu0eVWDt6oLTqvk_FB4W4zBJ3BDOaqUIAxgijh1MQWVIBbWh8JOaQpQaOj7QpkPiLMQvkcIbgdDihfoxKo-wuWhnqP3x4fN6rlcvz29rO7XpWaYpBIUaRtmKWtZyxXjDdeWmxp3lEHXAeZGC6KFNgZbkSeCqqZmLVhLiaHG0HN0s9-bHX9OEJPcuTi7UgP4Kcp6yWpRc5JBsgd18DEGsHLMVlX4kQTLOT-5lTk_OecnSS1zfllzfViuola9DWrQLv4JOReEcZy5uz0H-dMvB0FG7WDQYFwAnaTx7p8rv0rHh70</recordid><startdate>20050301</startdate><enddate>20050301</enddate><creator>Künzi, P.A.</creator><creator>Lussi, J.</creator><creator>Aeschimann, L.</creator><creator>Danuser, G.</creator><creator>Textor, M.</creator><creator>de Rooij, N.F.</creator><creator>Staufer, U.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20050301</creationdate><title>Nanofabrication of protein-patterned substrates for future cell adhesion experiments</title><author>Künzi, P.A. ; Lussi, J. ; Aeschimann, L. ; Danuser, G. ; Textor, M. ; de Rooij, N.F. ; Staufer, U.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c401t-ea1854f348486a4656cf6d20b34ebbe06dc71c7cdd0f7ebb73a5248eff31d3dd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Biological and medical sciences</topic><topic>Biotechnology</topic><topic>Electron beam lithography</topic><topic>Fundamental and applied biological sciences. Psychology</topic><topic>Indium-tin-oxide</topic><topic>Methods. Procedures. Technologies</topic><topic>Nanofabrication</topic><topic>Others</topic><topic>Protein adsorption</topic><topic>Protein patterning</topic><topic>Self-assembling</topic><topic>Various methods and equipments</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Künzi, P.A.</creatorcontrib><creatorcontrib>Lussi, J.</creatorcontrib><creatorcontrib>Aeschimann, L.</creatorcontrib><creatorcontrib>Danuser, G.</creatorcontrib><creatorcontrib>Textor, M.</creatorcontrib><creatorcontrib>de Rooij, N.F.</creatorcontrib><creatorcontrib>Staufer, U.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Künzi, P.A.</au><au>Lussi, J.</au><au>Aeschimann, L.</au><au>Danuser, G.</au><au>Textor, M.</au><au>de Rooij, N.F.</au><au>Staufer, U.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nanofabrication of protein-patterned substrates for future cell adhesion experiments</atitle><jtitle>Microelectronic engineering</jtitle><date>2005-03-01</date><risdate>2005</risdate><volume>78</volume><spage>582</spage><epage>586</epage><pages>582-586</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><coden>MIENEF</coden><abstract>A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO
2. The SiO
2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-
l-lysine-
g-poly(ethylene glycol) was used to passivate the surrounding SiO
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| fulltext | fulltext |
| identifier | ISSN: 0167-9317 |
| ispartof | Microelectronic engineering, 2005-03, Vol.78, p.582-586 |
| issn | 0167-9317 1873-5568 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_29427261 |
| source | ScienceDirect Freedom Collection |
| subjects | Biological and medical sciences Biotechnology Electron beam lithography Fundamental and applied biological sciences. Psychology Indium-tin-oxide Methods. Procedures. Technologies Nanofabrication Others Protein adsorption Protein patterning Self-assembling Various methods and equipments |
| title | Nanofabrication of protein-patterned substrates for future cell adhesion experiments |
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