Sub-10 nm High-Aspect-Ratio Patterning of ZnO Using an Electron Beam

An electron‐beam‐sensitive zinc naphthenate resist is used to pattern ZnO. Features as small as 7 nm and with an aspect ratio of ∼ 9 can be patterned. Size reduction to ∼ 5 nm is observed when these patterns are heat treated to give crystalline ZnO (see Figure). The functionality of ZnO is confirmed...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2005-07, Vol.17 (14), p.1757-1761
Main Authors: Saifullah, M. S. M., Subramanian, K. R. V., Kang, D.-J., Anderson, D., Huck, W. T. S., Jones, G. A. C., Welland, M. E.
Format: Article
Language:English
Subjects:
electron beam
inorganic
Lithography
Lithography, electron beam
Nanostructures
Nanostructures, inorganic
Patterning
Patterning, surface
Resist materials
surface
Zinc oxide
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Summary:An electron‐beam‐sensitive zinc naphthenate resist is used to pattern ZnO. Features as small as 7 nm and with an aspect ratio of ∼ 9 can be patterned. Size reduction to ∼ 5 nm is observed when these patterns are heat treated to give crystalline ZnO (see Figure). The functionality of ZnO is confirmed via photoluminescence studies.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200500484