Production of large area VHF plasma using ladder-shaped electrode

A VHF SiH4/H2 plasma was produced using a ladder-shaped electrode of 1200 mm×141 mm. In this case, VHF power up to 200 W was fed to the ladder-shaped electrode through the matching box. The plasma parameters in mixture gas plasma of SiH4/H2 were measured with a heated Langmuir probe and examined as...

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Bibliographic Details
Published in:Surface & coatings technology 2005-10, Vol.200 (1-4), p.972-975
Main Authors: Takatsuka, H., Takeuchi, Y., Yamauchi, Y., Shioya, T., Kawai, Y.
Format: Article
Language:English
Subjects:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Electron temperature
Exact sciences and technology
Ion saturation current
Ladder-shaped electrode
Materials science
Metals. Metallurgy
Other topics in materials science
Physics
Production techniques
Surface treatment
VHF plasma
Wall potential
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Summary:A VHF SiH4/H2 plasma was produced using a ladder-shaped electrode of 1200 mm×141 mm. In this case, VHF power up to 200 W was fed to the ladder-shaped electrode through the matching box. The plasma parameters in mixture gas plasma of SiH4/H2 were measured with a heated Langmuir probe and examined as a function of gas mixture rate. A uniform VHF plasma was achieved over 1 m at the frequency of 60 MHz. Furthermore, when the concentration of SiH4 gas was increased, the ion saturation current decreased while the electron temperature increased.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2005.02.010