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Chemically prepared well-ordered InP(0 0 1) surfaces

In the present work HCl-isopropanol treated and vacuum annealed InP(0 0 1) surfaces were studied by means of low-energy electron diffraction (LEED), soft X-ray photoemission (SXPS), and reflectance anisotropy (RAS) spectroscopies. The treatment removes the natural oxide and leaves on the surface a p...

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Bibliographic Details
Published in:Surface science 2006-08, Vol.600 (16), p.3160-3166
Main Authors: Tereshchenko, O.E., Paget, D., Chiaradia, P., Placidi, E., Bonnet, J.E., Wiame, F., Taleb-Ibrahimi, A.
Format: Article
Language:English
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Summary:In the present work HCl-isopropanol treated and vacuum annealed InP(0 0 1) surfaces were studied by means of low-energy electron diffraction (LEED), soft X-ray photoemission (SXPS), and reflectance anisotropy (RAS) spectroscopies. The treatment removes the natural oxide and leaves on the surface a physisorbed overlayer containing InCl x and phosphorus. Annealing at 230 °C induces desorption of InCl x overlayer and reveals a P-rich (2 × 1) surface. Subsequent annealing at higher temperature induces In-rich (2 × 4) surface. The structural properties of chemically prepared InP(0 0 1) surfaces were found to be similar to those obtained by decapping of As/P-capped epitaxial layers.
ISSN:0039-6028
1879-2758
DOI:10.1016/j.susc.2006.05.056