Surface structural analysis of h-BN/Ni (111) by X-ray photoelectron diffraction excited by Al Kalpha and Cr Lalpha lines

Using the Cr L (h = 572.8 eV) line, which has energy lower than conventional lines, X-ray photoelectron spectroscopy (XPS) and X-ray photoelectron diffraction (XPED) can be used to achieve surface-sensitive and light-element-sensitive measurements. We prepared hexagonal boron nitride (h-BN), which i...

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Bibliographic Details
Published in:Surface and interface analysis 2006-12, Vol.38 (12-13), p.1756-1759
Main Authors: Mochizuki, Hidehiro, Amano, Kentaro, Nojima, Masashi, Owari, Masanori, Nihei, Yoshimasa
Format: Article
Language:English
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Summary:Using the Cr L (h = 572.8 eV) line, which has energy lower than conventional lines, X-ray photoelectron spectroscopy (XPS) and X-ray photoelectron diffraction (XPED) can be used to achieve surface-sensitive and light-element-sensitive measurements. We prepared hexagonal boron nitride (h-BN), which is a light-element material, grown in a monolayer on a Ni (111) surface, and measured h-BN/Ni(111) by XPS/XPED excited by the Al K (h = 1486.6 eV) line and the Cr L line. Finally, we investigated the excitation-energy dependence of the XPED method with respect to energy of the photoelectrons and discuss the effectiveness of the XPED method using Cr L excitation.
ISSN:0142-2421
DOI:10.1002/sia.2446