Synthesis and fine patterning of organic-inorganic composite SiO2-Al2O3 thick films

• Published in: Applied surface science 2007-04, Vol.253 (12), p.5442-5446
• Main Authors: LIANG, Q. L, ZHAO, G. Y, LU, J. G
• Format: Article
• Language: English
• Subjects: Composite materials; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Materials synthesis; materials processing; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of specific thin films; Physics; Sol-gel processing, precipitation; Surface treatments
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2006.12.106

Organic-inorganic composite SiO2-Al2O3 films have been prepared by sol-gel using methacryloxypropyl trimethoxysilane and aluminum sec-butoxide as the precursors. By introduction of organic groups into the inorganic backbone, the smooth and crack-free films could be readily achieved by a one-step dip-coating process, with the thickness up to 4.6 after being post-baked at 200 deg C for 2 h. The films presented in an amorphous phase with an acceptable chemical homogeneity. Owing to the formation of chelate rings, the gel films showed a strong photosensitivity to ultraviolet light at 325 nm. The uniform fine patterns of SiO2-Al2O3 thick films could be well defined by ultraviolet light imprinting simply using a mask. These performances of SiO2-Al2O3 films indicate the potential for integrated optical systems.