Synthesis and mechanical properties of hydrogenated carbon and carbon nitride films prepared by magnetron sputtering

Hydrogenated carbon and carbon nitride films were synthesized by closed field unbalanced magnetron sputtering (CFUBM). The deposition rate, structure and mechanical properties of these films were studied as a function of applied bias voltage and nitrogen partial pressure on substrate during depositi...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 2006-05, Vol.506 (Complete), p.87-91
Main Authors: Myung, Hyun S., Park, Yong S., Hong, B., Han, Jeon G., Shaginyan, Leonid R.
Format: Article
Language:English
Subjects:
CFUBM
Hydrogenated carbon
Hydrogenated carbon nitride
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Hydrogenated carbon and carbon nitride films were synthesized by closed field unbalanced magnetron sputtering (CFUBM). The deposition rate, structure and mechanical properties of these films were studied as a function of applied bias voltage and nitrogen partial pressure on substrate during deposition. The film structures were investigated in Raman spectroscopy and FESEM. The hardness and elastic modulus were evaluated by nano-indentation test. Hydrogenated carbon films deposited at a bias of − 200 V exhibited a maximum hardness and a minimum electrical resistivity and hydrogenated carbon nitride films synthesized at a nitrogen partial pressure of 0.2 Pa showed minimum friction coefficient.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2005.08.095