Nanolayer Patterning Based on Surface Modification with Extreme Ultraviolet Light

Chlorine nanolayers can be modified by extreme UV (EUV) irradiation, which can be applied to the fabrication of various surface functional‐group patterns (see igure) owing to the striking contrast in reactivity between EUV‐exposed and ‐unexposed regions. The technique provides flexibility of surface...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2007-05, Vol.19 (10), p.1321-1324
Main Authors: Moon, S. W., Jeon, C., Hwang, H.-N., Hwang, C.-C., Song, H. J., Shin, H.-J., Chung, S., Park, C.-Y.
Format: Article
Language:English
Subjects:
Lithography
Lithography, ultraviolet
Microelectronics
Nanolithography
Nanopatterning
Patterning
Surface functionalization
ultraviolet
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Summary:Chlorine nanolayers can be modified by extreme UV (EUV) irradiation, which can be applied to the fabrication of various surface functional‐group patterns (see igure) owing to the striking contrast in reactivity between EUV‐exposed and ‐unexposed regions. The technique provides flexibility of surface functionalization and may be applicable to the manufacture of electronic, photonic, and biomolecular nanodevices.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200602166