Surface structure of thin asymmetric PS- b-PMMA diblock copolymers investigated by atomic force microscopy

• Published in: European polymer journal 2007-03, Vol.43 (3), p.789-796
• Main Authors: Khaydarov, A.A., Hamley, I.W., Legge, Thomas M., Perrier, Sébastien
• Format: Article
• Language: English
• Subjects: AFM; Applied sciences; Block copolymers; Exact sciences and technology; Organic polymers; Physicochemistry of polymers; Properties and characterization; PS- b-PMMA; RAFT; Structure, morphology and analysis; Thin films
• ISSN: 0014-3057; 1873-1945
• DOI: 10.1016/j.eurpolymj.2006.10.006

Asymmetric poly(styrene- b-methyl methacrylate) (PS- b-PMMA) diblock copolymers of molecular weight M n = 29,700 g mol −1 ( M PS = 9300 g mol −1 M PMMA = 20,100 g mol −1, PD = 1.15, χ PS = 0.323, χ PMMA = 0.677) and M n = 63,900 g mol −1 ( M PS = 50,500 g mol −1, M PMMA = 13,400 g mol −1, PD = 1.18, χ PS = 0.790, χ PMMA = 0.210) were prepared via reversible addition-fragmentation chain transfer (RAFT) polymerization. Atomic force microscopy (AFM) was used to investigate the surface structure of thin films, prepared by spin-coating the diblock copolymers on a silicon substrate. We show that the nanostructure of the diblock copolymer depends on the molecular weight and volume fraction of the diblock copolymers. We observed a perpendicular lamellar structure for the high molar mass sample and a hexagonal-packed cylindrical patterning for the lower molar mass one. Small-angle X-ray scattering investigation of these samples without annealing did not reveal any ordered structure. Annealing of PS- b-PMMA samples at 160 °C for 24 h led to a change in surface structure.