Design, fabrication, and implantation of invasive microelectrode arrays as in vivo brain machine interfaces: A comprehensive review

• Published in: Journal of manufacturing processes 2024-09, Vol.126, p.185-207
• Main Authors: Yi, Dongyang, Yao, Yao, Wang, Yi, Chen, Lei
• Format: Article
• Language: English
• Subjects: Brain-machine interfaces; Design; In vivo; Manufacturing processes; Microelectrode arrays; Surgical implantation
• ISSN: 1526-6125
• DOI: 10.1016/j.jmapro.2024.07.100

Invasive Microelectrode Arrays (MEAs) have been a significant and useful tool for us to gain a fundamental understanding of how the brain works through high spatiotemporal resolution neuron-level recordings and/or stimulations. Through decades of research, various types of microwire, silicon, and flexible substrate-based MEAs have been developed using the evolving new materials, novel design concepts, and cutting-edge advanced manufacturing capabilities. Surgical implantation of the latest minimal damaging flexible MEAs through the hard-to-penetrate brain membranes introduces new challenges and thus the development of implantation strategies and instruments for the latest MEAs. In this paper, studies on the design considerations and enabling manufacturing processes of various invasive MEAs as in vivo brain-machine interfaces have been reviewed to facilitate the development as well as the state-of-art of such brain-machine interfaces from an engineering perspective. The challenges and solution strategies developed for surgically implanting such interfaces into the brain have also been evaluated and summarized. Finally, the research gaps have been identified in the design, manufacturing, and implantation perspectives, and future research prospects in invasive MEA development have been proposed.