Loading…
Electrical characteristics of nano-PbS/SiO2/Si heterostructures obtained by chemical bath method
The PbS/SiO2/Si structures show a clockwise hysteresis of capacitance-voltage (C-V) characteristics. The loop width increases with temperature and sweep time. The conductance-voltage (G-V) characteristics also present a hysteresis effect with two bumps. Both characteristics show a strong shift with...
Saved in:
Published in: | Journal of Optoelectronics and Advanced Materials 2007-12, Vol.9 (12), p.3795-3802 |
---|---|
Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | |
---|---|
cites | |
container_end_page | 3802 |
container_issue | 12 |
container_start_page | 3795 |
container_title | Journal of Optoelectronics and Advanced Materials |
container_volume | 9 |
creator | Goldenblum, A Stancu, V Buda, M Iordache, G Botila, T Negrila, C |
description | The PbS/SiO2/Si structures show a clockwise hysteresis of capacitance-voltage (C-V) characteristics. The loop width increases with temperature and sweep time. The conductance-voltage (G-V) characteristics also present a hysteresis effect with two bumps. Both characteristics show a strong shift with frequency. We show that these effects are determined by the positive mobile ions injected in the oxide region during the chemical bath deposition of PbS and by the high concentration of Si/SiO2 interface states. The corresponding C-V and G-V characteristics are simulated and the main peculiarities of the experimental results are well reproduced by the modeled curves. |
format | article |
fullrecord | <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_31763190</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>31763190</sourcerecordid><originalsourceid>FETCH-LOGICAL-p186t-e52c1f3c852abb9bdc385120268e25f56797b88cbb64e3bb94f1179d9b89b7803</originalsourceid><addsrcrecordid>eNotj81KAzEYRbNQsNS-Q1buBvM_yVJK_YFCheq65st8w0Smk5pkFr69g7q5d3EPB-4VWXGlVaO4UTdkU8onY4zzVkouVuRjN2KoOQY_0jD47EPFHEuNodDU08lPqXmF4_0xHsQSdMBlT6XmOdQ54wJB9XHCjsL3IsDzrwl8HegZ65C6W3Ld-7Hg5r_X5P1x97Z9bvaHp5ftw765cGtqg1oE3stgtfAADrogreaCCWNR6F6b1rVgbQAwCuVCqH754DoH1kFrmVyTuz_vJaevGUs9nWMJOI5-wjSXk-Stkdwx-QPARVJP</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>31763190</pqid></control><display><type>article</type><title>Electrical characteristics of nano-PbS/SiO2/Si heterostructures obtained by chemical bath method</title><source>Full-Text Journals in Chemistry (Open access)</source><creator>Goldenblum, A ; Stancu, V ; Buda, M ; Iordache, G ; Botila, T ; Negrila, C</creator><creatorcontrib>Goldenblum, A ; Stancu, V ; Buda, M ; Iordache, G ; Botila, T ; Negrila, C</creatorcontrib><description>The PbS/SiO2/Si structures show a clockwise hysteresis of capacitance-voltage (C-V) characteristics. The loop width increases with temperature and sweep time. The conductance-voltage (G-V) characteristics also present a hysteresis effect with two bumps. Both characteristics show a strong shift with frequency. We show that these effects are determined by the positive mobile ions injected in the oxide region during the chemical bath deposition of PbS and by the high concentration of Si/SiO2 interface states. The corresponding C-V and G-V characteristics are simulated and the main peculiarities of the experimental results are well reproduced by the modeled curves.</description><identifier>ISSN: 1454-4164</identifier><language>eng</language><ispartof>Journal of Optoelectronics and Advanced Materials, 2007-12, Vol.9 (12), p.3795-3802</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784</link.rule.ids></links><search><creatorcontrib>Goldenblum, A</creatorcontrib><creatorcontrib>Stancu, V</creatorcontrib><creatorcontrib>Buda, M</creatorcontrib><creatorcontrib>Iordache, G</creatorcontrib><creatorcontrib>Botila, T</creatorcontrib><creatorcontrib>Negrila, C</creatorcontrib><title>Electrical characteristics of nano-PbS/SiO2/Si heterostructures obtained by chemical bath method</title><title>Journal of Optoelectronics and Advanced Materials</title><description>The PbS/SiO2/Si structures show a clockwise hysteresis of capacitance-voltage (C-V) characteristics. The loop width increases with temperature and sweep time. The conductance-voltage (G-V) characteristics also present a hysteresis effect with two bumps. Both characteristics show a strong shift with frequency. We show that these effects are determined by the positive mobile ions injected in the oxide region during the chemical bath deposition of PbS and by the high concentration of Si/SiO2 interface states. The corresponding C-V and G-V characteristics are simulated and the main peculiarities of the experimental results are well reproduced by the modeled curves.</description><issn>1454-4164</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNotj81KAzEYRbNQsNS-Q1buBvM_yVJK_YFCheq65st8w0Smk5pkFr69g7q5d3EPB-4VWXGlVaO4UTdkU8onY4zzVkouVuRjN2KoOQY_0jD47EPFHEuNodDU08lPqXmF4_0xHsQSdMBlT6XmOdQ54wJB9XHCjsL3IsDzrwl8HegZ65C6W3Ld-7Hg5r_X5P1x97Z9bvaHp5ftw765cGtqg1oE3stgtfAADrogreaCCWNR6F6b1rVgbQAwCuVCqH754DoH1kFrmVyTuz_vJaevGUs9nWMJOI5-wjSXk-Stkdwx-QPARVJP</recordid><startdate>20071201</startdate><enddate>20071201</enddate><creator>Goldenblum, A</creator><creator>Stancu, V</creator><creator>Buda, M</creator><creator>Iordache, G</creator><creator>Botila, T</creator><creator>Negrila, C</creator><scope>7SP</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20071201</creationdate><title>Electrical characteristics of nano-PbS/SiO2/Si heterostructures obtained by chemical bath method</title><author>Goldenblum, A ; Stancu, V ; Buda, M ; Iordache, G ; Botila, T ; Negrila, C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p186t-e52c1f3c852abb9bdc385120268e25f56797b88cbb64e3bb94f1179d9b89b7803</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Goldenblum, A</creatorcontrib><creatorcontrib>Stancu, V</creatorcontrib><creatorcontrib>Buda, M</creatorcontrib><creatorcontrib>Iordache, G</creatorcontrib><creatorcontrib>Botila, T</creatorcontrib><creatorcontrib>Negrila, C</creatorcontrib><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Optoelectronics and Advanced Materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Goldenblum, A</au><au>Stancu, V</au><au>Buda, M</au><au>Iordache, G</au><au>Botila, T</au><au>Negrila, C</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrical characteristics of nano-PbS/SiO2/Si heterostructures obtained by chemical bath method</atitle><jtitle>Journal of Optoelectronics and Advanced Materials</jtitle><date>2007-12-01</date><risdate>2007</risdate><volume>9</volume><issue>12</issue><spage>3795</spage><epage>3802</epage><pages>3795-3802</pages><issn>1454-4164</issn><abstract>The PbS/SiO2/Si structures show a clockwise hysteresis of capacitance-voltage (C-V) characteristics. The loop width increases with temperature and sweep time. The conductance-voltage (G-V) characteristics also present a hysteresis effect with two bumps. Both characteristics show a strong shift with frequency. We show that these effects are determined by the positive mobile ions injected in the oxide region during the chemical bath deposition of PbS and by the high concentration of Si/SiO2 interface states. The corresponding C-V and G-V characteristics are simulated and the main peculiarities of the experimental results are well reproduced by the modeled curves.</abstract><tpages>8</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1454-4164 |
ispartof | Journal of Optoelectronics and Advanced Materials, 2007-12, Vol.9 (12), p.3795-3802 |
issn | 1454-4164 |
language | eng |
recordid | cdi_proquest_miscellaneous_31763190 |
source | Full-Text Journals in Chemistry (Open access) |
title | Electrical characteristics of nano-PbS/SiO2/Si heterostructures obtained by chemical bath method |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T15%3A02%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrical%20characteristics%20of%20nano-PbS/SiO2/Si%20heterostructures%20obtained%20by%20chemical%20bath%20method&rft.jtitle=Journal%20of%20Optoelectronics%20and%20Advanced%20Materials&rft.au=Goldenblum,%20A&rft.date=2007-12-01&rft.volume=9&rft.issue=12&rft.spage=3795&rft.epage=3802&rft.pages=3795-3802&rft.issn=1454-4164&rft_id=info:doi/&rft_dat=%3Cproquest%3E31763190%3C/proquest%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-p186t-e52c1f3c852abb9bdc385120268e25f56797b88cbb64e3bb94f1179d9b89b7803%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=31763190&rft_id=info:pmid/&rfr_iscdi=true |