Annealing temperature effect on electrical and structural properties of Cu/Au Schottky contacts to n-type GaN

• Published in: Microelectronic engineering 2008-02, Vol.85 (2), p.470-476
• Main Authors: Rajagopal Reddy, V., Koteswara Rao, P.
• Format: Article
• Language: English
• Subjects: Applied sciences; Auger electron microscopy; Cu/Au Schottky diode; Diodes; Electrical and structural properties; Electronics; Exact sciences and technology; Interfaces; Microelectronic fabrication (materials and surfaces technology); Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; X-ray diffraction
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2007.08.006

Schottky contacts were fabricated on n-type GaN using a Cu/Au metallization scheme, and the electrical and structural properties have been investigated as a function of annealing temperature by current–voltage ( I– V), capacitance–voltage ( C– V), Auger electron spectroscopy (AES) and X-ray diffraction (XRD) measurements. The extracted Schottky barrier height of the as-deposited contact was found to be 0.69 eV ( I– V) and 0.77 eV ( C– V), respectively. However, the Schottky barrier height of the Cu/Au contact slightly increases to 0.77 eV ( I– V) and 1.18 eV ( C– V) when the contact was annealed at 300 °C for 1 min. It is shown that the Schottky barrier height decreases to 0.73 eV ( I– V) and 0.99 eV ( C– V), 0.56 eV ( I– V) and 0.87 eV ( C– V) after annealing at 400 °C and 500 °C for 1 min in N 2 atmosphere. Norde method was also used to extract the barrier height of Cu/Au contacts and the values are 0.69 eV for the as-deposited, 0.76 eV at 300 °C, 0.71 eV at 400 °C and 0.56 eV at 500 °C which are in good agreement with those obtained by the I– V method. Based on Auger electron spectroscopy and X-ray diffraction results, the formation of nitride phases at the Cu/Au/n-GaN interface could be the reason for the degradation of Schottky barrier height upon annealing at 500 °C.