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Characterization of substrate off-angle effects for high-quality homoepitaxial CVD diamond films
We have studied the substrate off-angle effects for the crystalline quality of the homoepitaxial diamond films mainly by using steady-state cathodoluminescence (CL) and time-resolved photoluminescence (PL) measurements. By means of the microwave plasma chemical vapor deposition method under high-pow...
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Published in: | Diamond and related materials 2008-04, Vol.17 (4), p.435-439 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We have studied the substrate off-angle effects for the crystalline quality of the homoepitaxial diamond films mainly by using steady-state cathodoluminescence (CL) and time-resolved photoluminescence (PL) measurements. By means of the microwave plasma chemical vapor deposition method under high-power microwave power with high methane concentrations, the homoepitaxial diamond films were grown on the high-pressure/high-temperature-synthesized (HPHT) Ib (001) substrates inclined along either or direction by different off-angles ranging from 2° to 5°. In spite of high growth rates, we have succeeded in improving crystalline quality by employing the HPHT substrates with considerably large off-angles. Both steady-state CL and time-resolved PL measurements clearly indicate that larger off-angles lead to better crystalline quality of the homoepitaxial film, suggesting that further improvements in crystalline quality can be expected when using substrates having even larger off-angles. |
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ISSN: | 0925-9635 1879-0062 |
DOI: | 10.1016/j.diamond.2007.12.052 |