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Highly thermal stable transparent conducting SnO2:Sb epitaxial films prepared on α-Al2O3 (0001) by MOCVD

Antimony-doped tin oxide (SnO2:Sb) single crystalline films have been prepared on alpha-Al2O3 (0 0 0 1) substrates by metal organic chemical vapor deposition (MOCVD). The antimony doping was varied from 2% to 7% (atomic ratio). Post-deposition annealing of the SnO2:Sb films was carried out at 700-11...

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Bibliographic Details
Published in:Applied surface science 2008-08, Vol.254 (20), p.6601-6604
Main Authors: Feng, Xianjin, Ma, Jin, Yang, Fan, Ji, Feng, Zong, Fujian, Luan, Caina, Ma, Honglei
Format: Article
Language:English
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Summary:Antimony-doped tin oxide (SnO2:Sb) single crystalline films have been prepared on alpha-Al2O3 (0 0 0 1) substrates by metal organic chemical vapor deposition (MOCVD). The antimony doping was varied from 2% to 7% (atomic ratio). Post-deposition annealing of the SnO2:Sb films was carried out at 700-1100 deg C for 30 min in atmosphere ambient. The effect of annealing on the structural, electrical and optical properties of the films was investigated in detail. All the SnO2:Sb films had good thermal stability under 900 deg C, and the 5% Sb-doped SnO2 film exhibited the best opto-electrical properties. Annealed above 900 deg C, the 7% Sb-doped SnO2 film still kept high thermal stability and showed good electrical and optical properties even at 1100 deg C.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2008.04.028