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Highly thermal stable transparent conducting SnO2:Sb epitaxial films prepared on α-Al2O3 (0001) by MOCVD
Antimony-doped tin oxide (SnO2:Sb) single crystalline films have been prepared on alpha-Al2O3 (0 0 0 1) substrates by metal organic chemical vapor deposition (MOCVD). The antimony doping was varied from 2% to 7% (atomic ratio). Post-deposition annealing of the SnO2:Sb films was carried out at 700-11...
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Published in: | Applied surface science 2008-08, Vol.254 (20), p.6601-6604 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Antimony-doped tin oxide (SnO2:Sb) single crystalline films have been prepared on alpha-Al2O3 (0 0 0 1) substrates by metal organic chemical vapor deposition (MOCVD). The antimony doping was varied from 2% to 7% (atomic ratio). Post-deposition annealing of the SnO2:Sb films was carried out at 700-1100 deg C for 30 min in atmosphere ambient. The effect of annealing on the structural, electrical and optical properties of the films was investigated in detail. All the SnO2:Sb films had good thermal stability under 900 deg C, and the 5% Sb-doped SnO2 film exhibited the best opto-electrical properties. Annealed above 900 deg C, the 7% Sb-doped SnO2 film still kept high thermal stability and showed good electrical and optical properties even at 1100 deg C. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2008.04.028 |