Structural and optical studies on hot wire chemical vapour deposited hydrogenated silicon films at low substrate temperature

Thin films of hydrogenated silicon are deposited by hot wire chemical vapour deposition technique, as an alternative of plasma enhanced chemical vapour deposition technique. By varying the hydrogen and silane flow rate, we deposited the films ranging from pure amorphous to nanocrystallite-embedded a...

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Bibliographic Details
Published in:Solar energy materials and solar cells 2009-02, Vol.93 (2), p.199-205
Main Authors: Gogoi, Purabi, Agarwal, Pratima
Format: Article
Language:English
Subjects:
Amorphous silicon
Applied sciences
Energy
Exact sciences and technology
Flow rates
HWCVD
Hydrogen
Hydrogen dilution
Nanocrystalline silicon
Natural energy
Photovoltaic conversion
Q1
Silicon
solar cells
Solar cells. Photoelectrochemical cells
Solar energy
Temperature
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Summary:Thin films of hydrogenated silicon are deposited by hot wire chemical vapour deposition technique, as an alternative of plasma enhanced chemical vapour deposition technique. By varying the hydrogen and silane flow rate, we deposited the films ranging from pure amorphous to nanocrystallite-embedded amorphous in nature. In this paper we report extensively studied structural and optical properties of these films. It is observed that the rms bond angle deviation decreases with increase in hydrogen flow rate, which is an indication of improved order in the films. We discuss this under the light of breaking of weak Si–Si bonds and subsequent formation of strong Si–Si bonds and coverage of the growing surface by atomic hydrogen.
ISSN:0927-0248
1879-3398
DOI:10.1016/j.solmat.2008.09.058