Vapor growth of electrochromic thin films of transition metal oxides

• Published in: Journal of crystal growth 2008-04, Vol.310 (7), p.2103-2109
• Main Authors: Gesheva, K.A., Ivanova, T., Marsen, B., Zollo, G., Kalitzova, M.
• Format: Article
• Language: English
• Subjects: A1. X-ray diffraction; A3. Metalorganic chemical vapor deposition; B1. Oxides; B2. Electrochromic properties; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Electrooptical effects; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of bulk materials and thin films; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/j.jcrysgro.2007.12.034

Mixed oxide films of transition metals gain considerable much attention due to their interesting optoelectronic properties. The low temperature chemical vapor growth processing of thin films of mixed W and Mo oxides is presented. The investigation is related to optimization of films structure and the related optoelectronic properties in dependence on the chemical vapor deposition (CVD) process parameters. Their electrochromic behavior and photoelectrode properties were studied.