Nanoindentation near the edge

Whenever a nanoindent is placed near an edge, such as the free edge of the specimen or heterophase interface intersecting the surface, the elastic discontinuity associated with the edge produces artifacts in the load–depth data. Unless properly handled in the data analysis, the artifacts can produce...

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Bibliographic Details
Published in:Journal of materials research 2009-03, Vol.24 (3), p.1016-1031
Main Authors: Jakes, J.E., Frihart, C.R., Beecher, J.F., Moon, R.J., Resto, P.J., Melgarejo, Z.H., Suárez, O.M., Baumgart, H., Elmustafa, A.A., Stone, D.S.
Format: Article
Language:English
Subjects:
Applied and Technical Physics
Biomaterials
Elastic properties
Hardness
Inorganic Chemistry
Materials Engineering
Materials Science
Nanoindentation
Nanotechnology
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Summary:Whenever a nanoindent is placed near an edge, such as the free edge of the specimen or heterophase interface intersecting the surface, the elastic discontinuity associated with the edge produces artifacts in the load–depth data. Unless properly handled in the data analysis, the artifacts can produce spurious results that obscure any real trends in properties as functions of position. Previously, we showed that the artifacts can be understood in terms of a structural compliance, Cs, which is independent of the size of the indent. In the present work, the utility of the SYS (Stone, Yoder, Sproul) correlation is demonstrated in its ability to remove the artifacts caused by Cs. We investigate properties: (i) near the surface of an extruded polymethyl methacrylate rod tested in cross section, (ii) of compound corner middle lamellae of loblolly pine (Pinus taeda) surrounded by relatively stiff wood cell walls, (iii) of wood cell walls embedded in a polypropylene matrix with some poorly bonded wood–matrix interfaces, (iv) of AlB2 particles embedded in an aluminum matrix, and (v) of silicon-on-insulator thin film on substrate near the free edge of the specimen.
ISSN:0884-2914
2044-5326
DOI:10.1557/jmr.2009.0076