The structure and photoluminescence properties of RF-sputtered films of ZnO on Teflon substrate

Polytetrafluoroethylene (Teflon) represents a competitive polymer choice in a variety of microelectronic applications due to its many advanced properties. In this paper ZnO films were prepared on Teflon substrate by RF magnetron sputtering. Scanning electron microscopy and X-ray diffraction measurem...

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Bibliographic Details
Published in:Materials letters 2008-06, Vol.62 (17), p.2907-2909
Main Authors: Liu, Yun-yan, Yuan, Yu-zhen, Li, Cheng-feng, Gao, Xu-tuan, Cao, Xin-zhong, Li, Jiang-bo
Format: Article
Language:English
Subjects:
Nano-crystal ZnO
Optical materials and properties
Photoluminescence
Polytetrafluoroethylene (Teflon)
RF magnetron sputtering
Thin films
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Summary:Polytetrafluoroethylene (Teflon) represents a competitive polymer choice in a variety of microelectronic applications due to its many advanced properties. In this paper ZnO films were prepared on Teflon substrate by RF magnetron sputtering. Scanning electron microscopy and X-ray diffraction measurements were performed to investigate the crystallinity of the films. Room temperature Photoluminescence spectra demonstrate an ultraviolet-blue emission of the ZnO grown on the flexible Teflon substrate at a RF power of 100 W. The visible emission intensity is much weaker compared to the ultraviolet emission (UVE), implying that the nanostructured ZnO films deposited on Teflon by RF magnetron sputtering are of high crystalline quality.
ISSN:0167-577X
1873-4979
DOI:10.1016/j.matlet.2008.01.070