Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Nanopatterned self‐assembled monolayers (SAMs) are obtained from a simple, straight‐forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diameters of approximately 60 nm on a continous...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2008-05, Vol.20 (10), p.1962-1965
Main Authors: Krishnamoorthy, Sivashankar, Pugin, Raphael, Brugger, Juergen, Heinzelmann, Harry, Hinderling, Christian
Format: Article
Language:English
Subjects:
block copolymers
lithography
micelles
self-assembled monolayers
surface patterning
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Summary:Nanopatterned self‐assembled monolayers (SAMs) are obtained from a simple, straight‐forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diameters of approximately 60 nm on a continous hydrobhopic background or vice versa. The surfaces are shown to be excellent tools for the preparation of arrays of nanocrystals.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200702005