Nanocrystalline ZrO2 thin films on silicon fabricated by pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD)

• Published in: Journal of materials research 2008-08, Vol.23 (8), p.2202-2211
• Main Authors: Ramirez, L., Mecartney, M.L., Krumdieck, S.P.
• Format: Article
• Language: English
• Subjects: Applied and Technical Physics; Biomaterials; Chemical vapor deposition (CVD) (deposition); Inorganic Chemistry; Materials Engineering; Materials Science; Nanotechnology; Scanning electron microscopy (SEM); Thin film
• ISSN: 0884-2914; 2044-5326
• DOI: 10.1557/JMR.2008.0267

ZrO2 films deposited on silicon (100) substrates using pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD) with zirconium n-propoxide (ZnP) Zr(OC3H7)4 were dense and fully crystalline for substrate temperatures of 500 to 700 °C. Film thicknesses were 40 to 815 nm thick, measured after growth using ellipsometry and scanning electron microscopy (SEM). The growth rate was between 0.1 μm/h at 500 °C and 1 μm/h at 700 °C. Transmission electron microscopy (TEM) and x-ray diffraction (XRD) indicated an average grain size of 10 to 20 nm. There was a random orientation of cubic/tetragonal zirconia at the highest experimental temperature of 700 °C. SEM and atomic force microscopy (AFM) was used to characterize island height of discontinuous films in the initial stages of growth where defects in the substrate caused preferred nucleation of isolated particles. At later stages of growth, the average surface roughness of continuous films was 30 nm, which revealed a more uniform growth had developed. A growth model is proposed, and optimal growth conditions are suggested for targeted microstructures of ZrO2 films.