Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

• Published in: Microelectronic engineering 2009-04, Vol.86 (4), p.874-877
• Main Authors: Chang, Tien-Li, Cheng, Kuei-Yuan, Chou, Ta-Hsin, Su, Chih-Chieh, Yang, Han-Ping, Luo, Shao-Wei
• Format: Article
• Language: English
• Subjects: Anti-adhesive layer; Applied sciences; Atmospheric-pressure plasma treatment; Electronics; Exact sciences and technology; Hybrid polymers; Microelectronic fabrication (materials and surfaces technology); Nanoimprint; Nanostructures; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Two-beam interference
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2009.01.038

This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic–organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process.