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Scalable Model of Substrate Resistance Components in RF MOSFETs With Bar-Type Body Contact Considered Layout Dimensions
Scalable model of substrate resistance components for radio-frequency MOSFETs fabricated by 65-nm CMOS technology with the bar-type body contact set in a horizontal direction to gate poly is presented. We consider various layout dimensions, such as channel length; unit finger width; number of finger...
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Published in: | IEEE electron device letters 2009-04, Vol.30 (4), p.404-406 |
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container_end_page | 406 |
container_issue | 4 |
container_start_page | 404 |
container_title | IEEE electron device letters |
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creator | IN MAN KANG JUNG, Seung-Jae CHOI, Tae-Hoon LEE, Hyunwoo JO, Gwangdoo KIM, Young-Kwang KIM, Han-Gu CHOI, Kyu-Myung |
description | Scalable model of substrate resistance components for radio-frequency MOSFETs fabricated by 65-nm CMOS technology with the bar-type body contact set in a horizontal direction to gate poly is presented. We consider various layout dimensions, such as channel length; unit finger width; number of fingers; distance between body contact and active region; and gate poly to gate poly distance on substrate resistance modeling. By using our model, the output admittance of the MOSFETs is well matched up to 50 GHz. The proposed models for substrate resistance are more accurate for devices with various geometries than previous substrate resistance models. |
doi_str_mv | 10.1109/LED.2009.2014085 |
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We consider various layout dimensions, such as channel length; unit finger width; number of fingers; distance between body contact and active region; and gate poly to gate poly distance on substrate resistance modeling. By using our model, the output admittance of the MOSFETs is well matched up to 50 GHz. The proposed models for substrate resistance are more accurate for devices with various geometries than previous substrate resistance models.</description><subject>Admittance</subject><subject>Applied sciences</subject><subject>Channels</subject><subject>CMOS</subject><subject>CMOS technology</subject><subject>Contact</subject><subject>Contact resistance</subject><subject>Design. Technologies. Operation analysis. Testing</subject><subject>Devices</subject><subject>Electrical impedance</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Fingers</subject><subject>Gates</subject><subject>Geometry</subject><subject>Immune system</subject><subject>Integrated circuits</subject><subject>MOSFETs</subject><subject>Parameter extraction</subject><subject>Radio frequency</subject><subject>radio-frequency (RF) MOSFETs</subject><subject>scalable model</subject><subject>Semiconductor device modeling</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. 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Solid state devices</topic><topic>Solid modeling</topic><topic>substrate resistance network</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>IN MAN KANG</creatorcontrib><creatorcontrib>JUNG, Seung-Jae</creatorcontrib><creatorcontrib>CHOI, Tae-Hoon</creatorcontrib><creatorcontrib>LEE, Hyunwoo</creatorcontrib><creatorcontrib>JO, Gwangdoo</creatorcontrib><creatorcontrib>KIM, Young-Kwang</creatorcontrib><creatorcontrib>KIM, Han-Gu</creatorcontrib><creatorcontrib>CHOI, Kyu-Myung</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998–Present</collection><collection>IEEE/IET Electronic Library</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE electron device letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>IN MAN KANG</au><au>JUNG, Seung-Jae</au><au>CHOI, Tae-Hoon</au><au>LEE, Hyunwoo</au><au>JO, Gwangdoo</au><au>KIM, Young-Kwang</au><au>KIM, Han-Gu</au><au>CHOI, Kyu-Myung</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Scalable Model of Substrate Resistance Components in RF MOSFETs With Bar-Type Body Contact Considered Layout Dimensions</atitle><jtitle>IEEE electron device letters</jtitle><stitle>LED</stitle><date>2009-04-01</date><risdate>2009</risdate><volume>30</volume><issue>4</issue><spage>404</spage><epage>406</epage><pages>404-406</pages><issn>0741-3106</issn><eissn>1558-0563</eissn><coden>EDLEDZ</coden><abstract>Scalable model of substrate resistance components for radio-frequency MOSFETs fabricated by 65-nm CMOS technology with the bar-type body contact set in a horizontal direction to gate poly is presented. 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subjects | Admittance Applied sciences Channels CMOS CMOS technology Contact Contact resistance Design. Technologies. Operation analysis. Testing Devices Electrical impedance Electronics Exact sciences and technology Fingers Gates Geometry Immune system Integrated circuits MOSFETs Parameter extraction Radio frequency radio-frequency (RF) MOSFETs scalable model Semiconductor device modeling Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Solid modeling substrate resistance network Transistors |
title | Scalable Model of Substrate Resistance Components in RF MOSFETs With Bar-Type Body Contact Considered Layout Dimensions |
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