Spontaneous emission control of silicon nanocrystals by silicon three-dimensional photonic crystal structure fabricated by self-aligned two-directional electrochemical etching method

A silicon three-dimensional photonic crystal (3DPC) structure has been fabricated using a self-aligned, two-directional electrochemical etching method. The spectral component of the photoluminescence (PL) for silicon nanocrystals deposited on the 3DPC structures increase at 750 nm and slightly decre...

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Bibliographic Details
Published in:Materials chemistry and physics 2009-07, Vol.116 (1), p.107-111
Main Authors: Hippo, Daihei, Urakawa, Kei, Tsuchiya, Yoshishige, Mizuta, Hiroshi, Koshida, Nobuyoshi, Oda, Shunri
Format: Article
Language:English
Subjects:
3D photonic crystal
Silicon nanocrystals
Time-resolved photoluminescence
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Summary:A silicon three-dimensional photonic crystal (3DPC) structure has been fabricated using a self-aligned, two-directional electrochemical etching method. The spectral component of the photoluminescence (PL) for silicon nanocrystals deposited on the 3DPC structures increase at 750 nm and slightly decrease at 800 nm. Time-resolved PL measurements reveal that the radiative recombination lifetime of the silicon nanocrystals on 3DPC structures decreases at 750 nm and increases at 800 nm compared to those on a silicon substrate without 3DPC structures. We conclude that the spontaneous emission control of silicon nanocrystals has been observed using the 3DPC structures.
ISSN:0254-0584
1879-3312
DOI:10.1016/j.matchemphys.2009.02.051