HFCVD of diamond and its application as electrode in aluminum electrolysis

The Hall–Heroult process of aluminum production is featured by the release of CO 2 as a result of the sacrificing graphite anode. Finding a proper inert anode active in oxygen evolution has been a research topic for electrochemists to have a green process of aluminum electrolysis. A thin layer of di...

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Bibliographic Details
Published in:Thin solid films 2009-04, Vol.517 (12), p.3559-3561
Main Authors: Wang, Shanshan, Chen, Guohua, Yang, Fenglin
Format: Article
Language:English
Subjects:
Boron-doped-diamond film
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Chemistry
Cross-disciplinary physics: materials science
rheology
Electrochemistry
Electrodes: preparations and properties
Exact sciences and technology
Fullerenes and related materials
diamonds, graphite
General and physical chemistry
Hot-filament chemical vapor deposition
Low temperature aluminum electrolysis
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Silicon wafer
Specific materials
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Summary:The Hall–Heroult process of aluminum production is featured by the release of CO 2 as a result of the sacrificing graphite anode. Finding a proper inert anode active in oxygen evolution has been a research topic for electrochemists to have a green process of aluminum electrolysis. A thin layer of diamond coating on silicon substrate has shown some promises. The challenges for the project are two folds, fabricating stable and active diamond electrode, and controlling proper electrolysis condition so as not to degrade the diamond thin film. This paper reports the recent findings from the authors' lab dealing with both challenges.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2009.01.035