Corrosion behaviour of amorphous Ni-Si thin films on AISI 304L stainless steel

Nanoscale Ni - Si thin films are widely used in commercial microelectronic devices because of their promising electrical properties as well as their chemical stability. However, their application in corrosive environment has not been frequently addressed in the literature. In this study, amorphous N...

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Bibliographic Details
Published in:Materials at high temperatures 2009-01, Vol.26 (2), p.177-186
Main Authors: Tam, P.L., Jelvestam, U., Nyborg, L.
Format: Article
Language:English
Subjects:
ALLOYS
Austenitic stainless steels
corrosion
Corrosion resistance
ESCA
ion-beam sputter deposition
Nanostructure
NICKEL
nickel silicides
OXYGEN
potentiostat
Scanning electron microscopy
SILICON
Silicon substrates
Stainless steels
Thin films
X-ray photoelectron spectroscopy
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Summary:Nanoscale Ni - Si thin films are widely used in commercial microelectronic devices because of their promising electrical properties as well as their chemical stability. However, their application in corrosive environment has not been frequently addressed in the literature. In this study, amorphous Ni 0.66 Si 0.33 , Ni 0.40 Si 0.60 , and Ni 0.20 Si 0.80 thin films are prepared on AISI 304L stainless steel by means of ion-beam sputter (IBS) deposition and their corrosion behaviour is studied using potentiodynamic polarisation measurements. The electrochemical measurements were conducted in 0.05M HCl solution at room temperature. By means of optical interferometer, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS), the surface morphology and chemical composition of the thin films were examined before and after the electrochemical measurement. The evaluated results showed that the Ni-Si thin films may exhibit improved corrosion resistance over the 304L substrate provided that Si content is high enough to facilitate the formation of a Si-rich passive film.
ISSN:0960-3409
1878-6413
DOI:10.3184/096034009X464159