A differential capacitive thin film hydrogen sensor

A compact, differential, hydrogen-specific sensor based on the lattice expansion of LaAl 0.3Ni 4.7 metal hydride thin films has been fabricated and characterized. Characterization of LaAl 0.3Ni 4.7 films performed using a capacitance dilatometer revealed that the lattice expansion was proportional t...

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Published in:Sensors and actuators. B, Chemical Chemical, 2009-09, Vol.141 (2), p.424-430
Main Authors: Kirby, D.J., Chang, D.T., Stratton, F.P., Zinck, J.J.
Format: Article
Language:English
Subjects:
Capacitance dilatometer
Capacitance measurement
Differential measurement
Hydrogen sensor
LaM xNi 5− x alloys
Lattice expansion
MEMS
Metal hydride
Thin film
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cited_by cdi_FETCH-LOGICAL-c328t-866151317e49f5bdd62a3e6e318e035ab3052867cdf47a368c1d3a75548013533
cites cdi_FETCH-LOGICAL-c328t-866151317e49f5bdd62a3e6e318e035ab3052867cdf47a368c1d3a75548013533
container_end_page 430
container_issue 2
container_start_page 424
container_title Sensors and actuators. B, Chemical
container_volume 141
creator Kirby, D.J.
Chang, D.T.
Stratton, F.P.
Zinck, J.J.
description A compact, differential, hydrogen-specific sensor based on the lattice expansion of LaAl 0.3Ni 4.7 metal hydride thin films has been fabricated and characterized. Characterization of LaAl 0.3Ni 4.7 films performed using a capacitance dilatometer revealed that the lattice expansion was proportional to the partial pressure of H 2 over the range 0.01–1.3 atm used in this experiment. The films were mechanically robust to cycling between vacuum and partial pressures of H 2 up to 1.3 atm and were not poisoned by exposure to atmosphere's containing up to 24% carbon monoxide. A wafer level process has been established for the fabrication of the differential hydrogen sensor which includes both an active LaAl 0.3Ni 4.7 sensing capacitor and an inert Au reference capacitor. A minimum sensitivity of 400 ppm hydrogen is calculated for the differential device.
doi_str_mv 10.1016/j.snb.2009.06.030
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_34732818</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0925400509005048</els_id><sourcerecordid>34732818</sourcerecordid><originalsourceid>FETCH-LOGICAL-c328t-866151317e49f5bdd62a3e6e318e035ab3052867cdf47a368c1d3a75548013533</originalsourceid><addsrcrecordid>eNp9kMtOwzAQRS0EEqXwAeyyYpcwzsSPilVV8ZIqsYG15doT6ip1ip1W6t-TqqxZ3c09M7qHsXsOFQcuHzdVjquqBphVICtAuGATrhWWCEpdsgnMalE2AOKa3eS8AYAGJUwYzgsf2pYSxSHYrnB2Z10YwoGKYR1i0YZuW6yPPvXfFItMMffpll21tst095dT9vXy_Ll4K5cfr--L-bJ0WOuh1FJywZEramatWHkva4skCbkmQGFXCKLWUjnfNsqi1I57tEqIRgNHgThlD-e7u9T_7CkPZhuyo66zkfp9Ntio8RHXY5Gfiy71OSdqzS6FrU1Hw8Gc9JiNGfWYkx4D0ox6RubpzNC44BAomewCRUc-JHKD8X34h_4F-Eprpg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>34732818</pqid></control><display><type>article</type><title>A differential capacitive thin film hydrogen sensor</title><source>ScienceDirect Freedom Collection 2022-2024</source><creator>Kirby, D.J. ; Chang, D.T. ; Stratton, F.P. ; Zinck, J.J.</creator><creatorcontrib>Kirby, D.J. ; Chang, D.T. ; Stratton, F.P. ; Zinck, J.J.</creatorcontrib><description>A compact, differential, hydrogen-specific sensor based on the lattice expansion of LaAl 0.3Ni 4.7 metal hydride thin films has been fabricated and characterized. Characterization of LaAl 0.3Ni 4.7 films performed using a capacitance dilatometer revealed that the lattice expansion was proportional to the partial pressure of H 2 over the range 0.01–1.3 atm used in this experiment. The films were mechanically robust to cycling between vacuum and partial pressures of H 2 up to 1.3 atm and were not poisoned by exposure to atmosphere's containing up to 24% carbon monoxide. A wafer level process has been established for the fabrication of the differential hydrogen sensor which includes both an active LaAl 0.3Ni 4.7 sensing capacitor and an inert Au reference capacitor. A minimum sensitivity of 400 ppm hydrogen is calculated for the differential device.</description><identifier>ISSN: 0925-4005</identifier><identifier>EISSN: 1873-3077</identifier><identifier>DOI: 10.1016/j.snb.2009.06.030</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Capacitance dilatometer ; Capacitance measurement ; Differential measurement ; Hydrogen sensor ; LaM xNi 5− x alloys ; Lattice expansion ; MEMS ; Metal hydride ; Thin film</subject><ispartof>Sensors and actuators. B, Chemical, 2009-09, Vol.141 (2), p.424-430</ispartof><rights>2009 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c328t-866151317e49f5bdd62a3e6e318e035ab3052867cdf47a368c1d3a75548013533</citedby><cites>FETCH-LOGICAL-c328t-866151317e49f5bdd62a3e6e318e035ab3052867cdf47a368c1d3a75548013533</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Kirby, D.J.</creatorcontrib><creatorcontrib>Chang, D.T.</creatorcontrib><creatorcontrib>Stratton, F.P.</creatorcontrib><creatorcontrib>Zinck, J.J.</creatorcontrib><title>A differential capacitive thin film hydrogen sensor</title><title>Sensors and actuators. B, Chemical</title><description>A compact, differential, hydrogen-specific sensor based on the lattice expansion of LaAl 0.3Ni 4.7 metal hydride thin films has been fabricated and characterized. Characterization of LaAl 0.3Ni 4.7 films performed using a capacitance dilatometer revealed that the lattice expansion was proportional to the partial pressure of H 2 over the range 0.01–1.3 atm used in this experiment. The films were mechanically robust to cycling between vacuum and partial pressures of H 2 up to 1.3 atm and were not poisoned by exposure to atmosphere's containing up to 24% carbon monoxide. A wafer level process has been established for the fabrication of the differential hydrogen sensor which includes both an active LaAl 0.3Ni 4.7 sensing capacitor and an inert Au reference capacitor. A minimum sensitivity of 400 ppm hydrogen is calculated for the differential device.</description><subject>Capacitance dilatometer</subject><subject>Capacitance measurement</subject><subject>Differential measurement</subject><subject>Hydrogen sensor</subject><subject>LaM xNi 5− x alloys</subject><subject>Lattice expansion</subject><subject>MEMS</subject><subject>Metal hydride</subject><subject>Thin film</subject><issn>0925-4005</issn><issn>1873-3077</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp9kMtOwzAQRS0EEqXwAeyyYpcwzsSPilVV8ZIqsYG15doT6ip1ip1W6t-TqqxZ3c09M7qHsXsOFQcuHzdVjquqBphVICtAuGATrhWWCEpdsgnMalE2AOKa3eS8AYAGJUwYzgsf2pYSxSHYrnB2Z10YwoGKYR1i0YZuW6yPPvXfFItMMffpll21tst095dT9vXy_Ll4K5cfr--L-bJ0WOuh1FJywZEramatWHkva4skCbkmQGFXCKLWUjnfNsqi1I57tEqIRgNHgThlD-e7u9T_7CkPZhuyo66zkfp9Ntio8RHXY5Gfiy71OSdqzS6FrU1Hw8Gc9JiNGfWYkx4D0ox6RubpzNC44BAomewCRUc-JHKD8X34h_4F-Eprpg</recordid><startdate>20090907</startdate><enddate>20090907</enddate><creator>Kirby, D.J.</creator><creator>Chang, D.T.</creator><creator>Stratton, F.P.</creator><creator>Zinck, J.J.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope></search><sort><creationdate>20090907</creationdate><title>A differential capacitive thin film hydrogen sensor</title><author>Kirby, D.J. ; Chang, D.T. ; Stratton, F.P. ; Zinck, J.J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c328t-866151317e49f5bdd62a3e6e318e035ab3052867cdf47a368c1d3a75548013533</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Capacitance dilatometer</topic><topic>Capacitance measurement</topic><topic>Differential measurement</topic><topic>Hydrogen sensor</topic><topic>LaM xNi 5− x alloys</topic><topic>Lattice expansion</topic><topic>MEMS</topic><topic>Metal hydride</topic><topic>Thin film</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kirby, D.J.</creatorcontrib><creatorcontrib>Chang, D.T.</creatorcontrib><creatorcontrib>Stratton, F.P.</creatorcontrib><creatorcontrib>Zinck, J.J.</creatorcontrib><collection>CrossRef</collection><collection>Mechanical &amp; Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Sensors and actuators. B, Chemical</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kirby, D.J.</au><au>Chang, D.T.</au><au>Stratton, F.P.</au><au>Zinck, J.J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A differential capacitive thin film hydrogen sensor</atitle><jtitle>Sensors and actuators. B, Chemical</jtitle><date>2009-09-07</date><risdate>2009</risdate><volume>141</volume><issue>2</issue><spage>424</spage><epage>430</epage><pages>424-430</pages><issn>0925-4005</issn><eissn>1873-3077</eissn><abstract>A compact, differential, hydrogen-specific sensor based on the lattice expansion of LaAl 0.3Ni 4.7 metal hydride thin films has been fabricated and characterized. Characterization of LaAl 0.3Ni 4.7 films performed using a capacitance dilatometer revealed that the lattice expansion was proportional to the partial pressure of H 2 over the range 0.01–1.3 atm used in this experiment. The films were mechanically robust to cycling between vacuum and partial pressures of H 2 up to 1.3 atm and were not poisoned by exposure to atmosphere's containing up to 24% carbon monoxide. A wafer level process has been established for the fabrication of the differential hydrogen sensor which includes both an active LaAl 0.3Ni 4.7 sensing capacitor and an inert Au reference capacitor. A minimum sensitivity of 400 ppm hydrogen is calculated for the differential device.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.snb.2009.06.030</doi><tpages>7</tpages></addata></record>
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subjects Capacitance dilatometer
Capacitance measurement
Differential measurement
Hydrogen sensor
LaM xNi 5− x alloys
Lattice expansion
MEMS
Metal hydride
Thin film
title A differential capacitive thin film hydrogen sensor
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T09%3A38%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20differential%20capacitive%20thin%20film%20hydrogen%20sensor&rft.jtitle=Sensors%20and%20actuators.%20B,%20Chemical&rft.au=Kirby,%20D.J.&rft.date=2009-09-07&rft.volume=141&rft.issue=2&rft.spage=424&rft.epage=430&rft.pages=424-430&rft.issn=0925-4005&rft.eissn=1873-3077&rft_id=info:doi/10.1016/j.snb.2009.06.030&rft_dat=%3Cproquest_cross%3E34732818%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c328t-866151317e49f5bdd62a3e6e318e035ab3052867cdf47a368c1d3a75548013533%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=34732818&rft_id=info:pmid/&rfr_iscdi=true