Development of a very large-area ultraviolet imprint lithography process

We propose a very large-area ultraviolet imprint lithography process as a promising alternative to expensive conventional optical lithography for the production of display panels. This process uses a large-area hard stamp in a low vacuum environment. The hard quartz stamp is used to achieve high ove...

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Bibliographic Details
Published in:Microelectronic engineering 2009-10, Vol.86 (10), p.1983-1988
Main Authors: Kim, Ki-don, Jeong, Jun-ho, Park, Sang-hu, Choi, Dae-geun, Choi, Jun-hyuk, Lee, Eung-sug
Format: Article
Language:English
Subjects:
Applied sciences
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Electronics
Exact sciences and technology
Hard stamp
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Ultraviolet imprint process
Vacuum environment
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Summary:We propose a very large-area ultraviolet imprint lithography process as a promising alternative to expensive conventional optical lithography for the production of display panels. This process uses a large-area hard stamp in a low vacuum environment. The hard quartz stamp is used to achieve high overlay accuracy, and the vacuum environment is required to ensure that air bubble defects do not occur during imprinting. We demonstrate that the quartz stamp with microscale patterns can be used for imprinting 18-in. diagonal substrates via single-step UV imprint in a low vacuum environment to obtain a practical residual layer thickness (RLT) for micro pattern transfer to the substrate. Numerical analysis is performed to clarify the physical phenomena underlying imprint process.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2008.12.068