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On the amorphous and nanocrystalline Zr–Cu and Zr–Ti co-sputtered thin films
In the current study, we examined and compared the mixing and vitrification behavior of the Zr–Cu and Zr–Ti binary systems in the form of co-sputtered thin films with or without post-annealing. The co-sputtered Zr–Cu films are all amorphous under various co-sputtering conditions, suggesting the high...
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Published in: | Journal of alloys and compounds 2009-08, Vol.483 (1), p.337-340 |
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Main Authors: | , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | In the current study, we examined and compared the mixing and vitrification behavior of the Zr–Cu and Zr–Ti binary systems in the form of co-sputtered thin films with or without post-annealing. The co-sputtered Zr–Cu films are all amorphous under various co-sputtering conditions, suggesting the high vitrification tendency. The amorphous Zr–Cu thin film will start to crystallize into nano-crystalline Zr
2Cu and Zr
7Cu
10 phases upon long exposure at temperatures above 350
°C. On the other hand, it is difficult to form amorphous film with the Zr–Ti system, except at a low sputtering power of 30–50
W. The low powers enable the co-sputtered Zr–Ti thin film to exhibit the diffuse hump in the X-ray diffraction. Examination by high resolution transmission electron microscopy reveals numerous fine nano-crystalline phases around 2
nm in the amorphous matrix. Upon exposure at 700
°C, the Zr–Ti films transform into crystalline hexagonal close-packed α and body-centered cubic β phases. |
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ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2008.07.188 |