A UV curable resin with reworkable properties: application to imprint lithography

Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254...

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Bibliographic Details
Published in:Journal of materials chemistry 2009-01, Vol.19 (24), p.4085-4087
Main Authors: MATSUKAWA, Daisaku, WAKAYAMA, Hiroyuki, MITSUKURA, Kazuyuki, OKAMURA, Haruyuki, HIRAI, Yoshihiko, SHIRAI, Masamitsu
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Materials
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254 nm light.
ISSN:0959-9428
1364-5501
DOI:10.1039/b905188k