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Laser micro structuring on a Si substrate for improving surface hydrophobicity
355 nm diode-pumped solid-state (DPSS) ultraviolet (UV) laser-induced surface texturing on a Si substrate is reported in this paper. Surface patterns consisting of miro-size pits were produced by direct laser ablation. By fine-tuning key process variables such as laser beam fluence, pulse number, an...
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Published in: | Journal of micromechanics and microengineering 2009-08, Vol.19 (8), p.085025-085025 (6) |
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container_end_page | 085025 (6) |
container_issue | 8 |
container_start_page | 085025 |
container_title | Journal of micromechanics and microengineering |
container_volume | 19 |
creator | Wang, X C Wu, Linda Y L Shao, Q Zheng, H Y |
description | 355 nm diode-pumped solid-state (DPSS) ultraviolet (UV) laser-induced surface texturing on a Si substrate is reported in this paper. Surface patterns consisting of miro-size pits were produced by direct laser ablation. By fine-tuning key process variables such as laser beam fluence, pulse number, and beam spot separation, uniform and repeatable micropatterns with nano features have been generated on the Si surface. Under appropriate optimum laser conditions, the surface contact angle of the Si substrate was increased from 64.2 deg to 97.5 deg. Furthermore, it was demonstrated that the laser textured Si substrate could be used as a template for imprinting. After imprinting the laser-induced pattern onto the sol-gel film, the sol-gel film surface contact angle was increased by nearly 30 deg up to 138 deg due to two-tier rough surfaces. |
doi_str_mv | 10.1088/0960-1317/19/8/085025 |
format | article |
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Surface patterns consisting of miro-size pits were produced by direct laser ablation. By fine-tuning key process variables such as laser beam fluence, pulse number, and beam spot separation, uniform and repeatable micropatterns with nano features have been generated on the Si surface. Under appropriate optimum laser conditions, the surface contact angle of the Si substrate was increased from 64.2 deg to 97.5 deg. Furthermore, it was demonstrated that the laser textured Si substrate could be used as a template for imprinting. After imprinting the laser-induced pattern onto the sol-gel film, the sol-gel film surface contact angle was increased by nearly 30 deg up to 138 deg due to two-tier rough surfaces.</description><identifier>ISSN: 0960-1317</identifier><identifier>EISSN: 1361-6439</identifier><identifier>DOI: 10.1088/0960-1317/19/8/085025</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Instruments, apparatus, components and techniques common to several branches of physics and astronomy ; Mechanical engineering. Machine design ; Mechanical instruments, equipment and techniques ; Microelectronic fabrication (materials and surfaces technology) ; Micromechanical devices and systems ; Physics ; Precision engineering, watch making ; Semiconductor electronics. Microelectronics. Optoelectronics. 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Surface patterns consisting of miro-size pits were produced by direct laser ablation. By fine-tuning key process variables such as laser beam fluence, pulse number, and beam spot separation, uniform and repeatable micropatterns with nano features have been generated on the Si surface. Under appropriate optimum laser conditions, the surface contact angle of the Si substrate was increased from 64.2 deg to 97.5 deg. Furthermore, it was demonstrated that the laser textured Si substrate could be used as a template for imprinting. After imprinting the laser-induced pattern onto the sol-gel film, the sol-gel film surface contact angle was increased by nearly 30 deg up to 138 deg due to two-tier rough surfaces.</description><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>Mechanical engineering. Machine design</subject><subject>Mechanical instruments, equipment and techniques</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Micromechanical devices and systems</subject><subject>Physics</subject><subject>Precision engineering, watch making</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. 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Machine design</topic><topic>Mechanical instruments, equipment and techniques</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Micromechanical devices and systems</topic><topic>Physics</topic><topic>Precision engineering, watch making</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, X C</creatorcontrib><creatorcontrib>Wu, Linda Y L</creatorcontrib><creatorcontrib>Shao, Q</creatorcontrib><creatorcontrib>Zheng, H Y</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Aerospace Database</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of micromechanics and microengineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, X C</au><au>Wu, Linda Y L</au><au>Shao, Q</au><au>Zheng, H Y</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Laser micro structuring on a Si substrate for improving surface hydrophobicity</atitle><jtitle>Journal of micromechanics and microengineering</jtitle><date>2009-08-01</date><risdate>2009</risdate><volume>19</volume><issue>8</issue><spage>085025</spage><epage>085025 (6)</epage><pages>085025-085025 (6)</pages><issn>0960-1317</issn><eissn>1361-6439</eissn><abstract>355 nm diode-pumped solid-state (DPSS) ultraviolet (UV) laser-induced surface texturing on a Si substrate is reported in this paper. Surface patterns consisting of miro-size pits were produced by direct laser ablation. By fine-tuning key process variables such as laser beam fluence, pulse number, and beam spot separation, uniform and repeatable micropatterns with nano features have been generated on the Si surface. Under appropriate optimum laser conditions, the surface contact angle of the Si substrate was increased from 64.2 deg to 97.5 deg. Furthermore, it was demonstrated that the laser textured Si substrate could be used as a template for imprinting. After imprinting the laser-induced pattern onto the sol-gel film, the sol-gel film surface contact angle was increased by nearly 30 deg up to 138 deg due to two-tier rough surfaces.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><doi>10.1088/0960-1317/19/8/085025</doi></addata></record> |
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source | Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List) |
subjects | Applied sciences Electronics Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Mechanical engineering. Machine design Mechanical instruments, equipment and techniques Microelectronic fabrication (materials and surfaces technology) Micromechanical devices and systems Physics Precision engineering, watch making Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
title | Laser micro structuring on a Si substrate for improving surface hydrophobicity |
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