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Micromachined resonators of high Q-factor based on atomic layer deposited alumina
In this paper, atomic layer deposited (ALD) alumina (Al 2O 3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of chromium (Cr) coated ALD Al 2O 3 was used as a resonator. The resonator was formed by simple wet...
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Published in: | Sensors and actuators. A. Physical. 2009-09, Vol.154 (2), p.229-237 |
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container_end_page | 237 |
container_issue | 2 |
container_start_page | 229 |
container_title | Sensors and actuators. A. Physical. |
container_volume | 154 |
creator | Chang, Yuan-Jen Gray, Jason M. Imtiaz, Atif Seghete, Dragos Mitch Wallis, T. George, Steven M. Kabos, Pavel Rogers, Charles T. Bright, Victor M. |
description | In this paper, atomic layer deposited (ALD) alumina (Al
2O
3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of chromium (Cr) coated ALD Al
2O
3 was used as a resonator. The resonator was formed by simple wet- and dry-etching processes. The static displacement profile of the micro-resonator under electrostatic load was measured by an optical interferometer. A model of a pinned–pinned beam with axial stress of 250
MPa was used to fit the measured data. Two techniques based on scanning electron microscope (SEM) and atomic force microscope (AFM) were developed to characterize the resonant frequencies of different modes and quality factor of the resonator. The measured resonant frequencies match well with the calculated values with residual stress of 258
MPa, providing additional insight into resonator model and ALD alumina material properties. The developed techniques can be applied to further size reduction of devices made with ALD methods. |
doi_str_mv | 10.1016/j.sna.2008.11.015 |
format | article |
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2O
3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of chromium (Cr) coated ALD Al
2O
3 was used as a resonator. The resonator was formed by simple wet- and dry-etching processes. The static displacement profile of the micro-resonator under electrostatic load was measured by an optical interferometer. A model of a pinned–pinned beam with axial stress of 250
MPa was used to fit the measured data. Two techniques based on scanning electron microscope (SEM) and atomic force microscope (AFM) were developed to characterize the resonant frequencies of different modes and quality factor of the resonator. The measured resonant frequencies match well with the calculated values with residual stress of 258
MPa, providing additional insight into resonator model and ALD alumina material properties. The developed techniques can be applied to further size reduction of devices made with ALD methods.</description><identifier>ISSN: 0924-4247</identifier><identifier>EISSN: 1873-3069</identifier><identifier>DOI: 10.1016/j.sna.2008.11.015</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>AFM ; Alumina ; Atomic layer deposition ; Micro-resonator ; Resonant frequency ; SEM</subject><ispartof>Sensors and actuators. A. Physical., 2009-09, Vol.154 (2), p.229-237</ispartof><rights>2008 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c328t-71d09b2154657a53edc43b1d72707c69b15962524470d69ff4921c874bd3fc7b3</citedby><cites>FETCH-LOGICAL-c328t-71d09b2154657a53edc43b1d72707c69b15962524470d69ff4921c874bd3fc7b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Chang, Yuan-Jen</creatorcontrib><creatorcontrib>Gray, Jason M.</creatorcontrib><creatorcontrib>Imtiaz, Atif</creatorcontrib><creatorcontrib>Seghete, Dragos</creatorcontrib><creatorcontrib>Mitch Wallis, T.</creatorcontrib><creatorcontrib>George, Steven M.</creatorcontrib><creatorcontrib>Kabos, Pavel</creatorcontrib><creatorcontrib>Rogers, Charles T.</creatorcontrib><creatorcontrib>Bright, Victor M.</creatorcontrib><title>Micromachined resonators of high Q-factor based on atomic layer deposited alumina</title><title>Sensors and actuators. A. Physical.</title><description>In this paper, atomic layer deposited (ALD) alumina (Al
2O
3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of chromium (Cr) coated ALD Al
2O
3 was used as a resonator. The resonator was formed by simple wet- and dry-etching processes. The static displacement profile of the micro-resonator under electrostatic load was measured by an optical interferometer. A model of a pinned–pinned beam with axial stress of 250
MPa was used to fit the measured data. Two techniques based on scanning electron microscope (SEM) and atomic force microscope (AFM) were developed to characterize the resonant frequencies of different modes and quality factor of the resonator. The measured resonant frequencies match well with the calculated values with residual stress of 258
MPa, providing additional insight into resonator model and ALD alumina material properties. The developed techniques can be applied to further size reduction of devices made with ALD methods.</description><subject>AFM</subject><subject>Alumina</subject><subject>Atomic layer deposition</subject><subject>Micro-resonator</subject><subject>Resonant frequency</subject><subject>SEM</subject><issn>0924-4247</issn><issn>1873-3069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp9kE9LwzAYxoMoOKcfwFtO3lrzJmnT4EmGTmEiAz2HNEldRtvMpBP27c2YZ08vPH9eeH4I3QIpgUB9vy3TqEtKSFMClASqMzSDRrCCkVqeoxmRlBeccnGJrlLaEkIYE2KG1m_exDBos_Gjszi6FEY9hZhw6PDGf23wuui0yQpudcqJMOLsD97gXh9cxNbtQvJTdnS_H_yor9FFp_vkbv7uHH0-P30sXorV-_J18bgqDKPNVAiwRLYUKl5XQlfMWcNZC1ZQQYSpZQuVrGlFORfE1rLruKRgGsFbyzojWjZHd6e_uxi-9y5NavDJuL7Xowv7pBhvGkqpzEE4BfPQlKLr1C76QceDAqKO8NRWZXjqCE8BqAwvdx5OHZcX_HgXVTLejcZZH52ZlA3-n_YvxON3AA</recordid><startdate>20090924</startdate><enddate>20090924</enddate><creator>Chang, Yuan-Jen</creator><creator>Gray, Jason M.</creator><creator>Imtiaz, Atif</creator><creator>Seghete, Dragos</creator><creator>Mitch Wallis, T.</creator><creator>George, Steven M.</creator><creator>Kabos, Pavel</creator><creator>Rogers, Charles T.</creator><creator>Bright, Victor M.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20090924</creationdate><title>Micromachined resonators of high Q-factor based on atomic layer deposited alumina</title><author>Chang, Yuan-Jen ; Gray, Jason M. ; Imtiaz, Atif ; Seghete, Dragos ; Mitch Wallis, T. ; George, Steven M. ; Kabos, Pavel ; Rogers, Charles T. ; Bright, Victor M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c328t-71d09b2154657a53edc43b1d72707c69b15962524470d69ff4921c874bd3fc7b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>AFM</topic><topic>Alumina</topic><topic>Atomic layer deposition</topic><topic>Micro-resonator</topic><topic>Resonant frequency</topic><topic>SEM</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chang, Yuan-Jen</creatorcontrib><creatorcontrib>Gray, Jason M.</creatorcontrib><creatorcontrib>Imtiaz, Atif</creatorcontrib><creatorcontrib>Seghete, Dragos</creatorcontrib><creatorcontrib>Mitch Wallis, T.</creatorcontrib><creatorcontrib>George, Steven M.</creatorcontrib><creatorcontrib>Kabos, Pavel</creatorcontrib><creatorcontrib>Rogers, Charles T.</creatorcontrib><creatorcontrib>Bright, Victor M.</creatorcontrib><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Sensors and actuators. A. Physical.</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chang, Yuan-Jen</au><au>Gray, Jason M.</au><au>Imtiaz, Atif</au><au>Seghete, Dragos</au><au>Mitch Wallis, T.</au><au>George, Steven M.</au><au>Kabos, Pavel</au><au>Rogers, Charles T.</au><au>Bright, Victor M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Micromachined resonators of high Q-factor based on atomic layer deposited alumina</atitle><jtitle>Sensors and actuators. A. Physical.</jtitle><date>2009-09-24</date><risdate>2009</risdate><volume>154</volume><issue>2</issue><spage>229</spage><epage>237</epage><pages>229-237</pages><issn>0924-4247</issn><eissn>1873-3069</eissn><abstract>In this paper, atomic layer deposited (ALD) alumina (Al
2O
3) has been demonstrated as the structural material for a micro-resonator for the first time. An electrostatically actuated micro-bridge made of chromium (Cr) coated ALD Al
2O
3 was used as a resonator. The resonator was formed by simple wet- and dry-etching processes. The static displacement profile of the micro-resonator under electrostatic load was measured by an optical interferometer. A model of a pinned–pinned beam with axial stress of 250
MPa was used to fit the measured data. Two techniques based on scanning electron microscope (SEM) and atomic force microscope (AFM) were developed to characterize the resonant frequencies of different modes and quality factor of the resonator. The measured resonant frequencies match well with the calculated values with residual stress of 258
MPa, providing additional insight into resonator model and ALD alumina material properties. The developed techniques can be applied to further size reduction of devices made with ALD methods.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.sna.2008.11.015</doi><tpages>9</tpages></addata></record> |
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issn | 0924-4247 1873-3069 |
language | eng |
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source | ScienceDirect Journals |
subjects | AFM Alumina Atomic layer deposition Micro-resonator Resonant frequency SEM |
title | Micromachined resonators of high Q-factor based on atomic layer deposited alumina |
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