An assessment of the process capabilities of nanoimprint lithography

• Published in: Journal of physics. D, Applied physics Applied physics, 2008-09, Vol.41 (17), p.174001-174001 (10)
• Main Authors: Balla, Tobias, Spearing, S Mark, Monk, Andrew
• Format: Article
• Language: English
• Subjects: Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of nanofabrication; Nanolithography; Physics
• ISSN: 0022-3727; 1361-6463
• DOI: 10.1088/0022-3727/41/17/174001

Nanoimprint lithography (NIL) is an emerging nanofabrication tool, able to replicate imprint patterns quickly and at high volumes. The present study was performed in order to define the capabilities of NIL, based on a study of published research and to identify the application areas where NIL has the greatest potential. The process attributes of different NIL process chains were analysed, and their process capabilities were compared to identify trends and process limitations. The attributes chosen include the line width, relief height, initial resist thickness, residual layer thickness, imprint area and line width tolerances. In each case well-defined limits can be identified, which are a direct result of the mechanisms involved in the NIL process. These quantitative results were compared with the assessments of individuals in academia and within the microfabrication industry. The results suggest NIL is most suited to producing photonic, microfluidic and patterned media applications, with photonic applications the closest to market. NIL needs to address overlay alignment issues for wider use, while an analysis is needed for each market, as to whether NIL adds value.