Mapping of chemical bonding states of Ag/Si(111) with synchrotron radiation photo emission electron microscopy

• Published in: Surface and interface analysis 2008-12, Vol.40 (13), p.1772-1776
• Main Authors: Hashimoto, M., Guo, F.-Z., Suzuki, M., Ueda, M., Matsuoka, Y., Kinoshita, T., Kobayashi, K., Shin, S., Oura, M., Takeuchi, T., Saito, Y., Matsushita, T., Yasue, T., Koshikawa, T.
• Format: Article
• Language: English
• Subjects: Ag/Si; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Electron and ion emission by liquids and solids; impact phenomena; Electron, ion, and scanning probe microscopy; Exact sciences and technology; local area XPS; Photoemission and photoelectron spectra; Physics; Scanning auger microscopy, photoelectron microscopy; Structure of solids and liquids; crystallography; XPEEM
• ISSN: 0142-2421; 1096-9918
• DOI: 10.1002/sia.2988

The chemical state sensitive imaging of Ag/Si (111) using Ag 3d core photoelectrons was tried using a spectroscopic photo emission and low energy electron microscopy at SPring‐8. XPS spectrum obtained from the two‐dimensional (2D) Ag/Si(111) √3 × √3 structure exhibits the chemical shift of about 0.5 eV toward the higher binding energy with respect to that from the three‐dimensional (3D) Ag(111) island with 1 × 1 structure. The direct imaging of the difference in the chemical bonding state between the 3D and 2D structure has been tried, but it was not easy because the XPS signal from the 3D island was fairly larger than that from the 2D layer. The XPEEM images relative to a reference image taken in between XPS peaks of the 3D and 2D structures made the visualization of the different chemical state possible. Copyright © 2008 John Wiley & Sons, Ltd.