Submicron gold structures formed by atomic force microscopy lithography on thin films of poly(methyl methacrylate)

Thin films of poly(methyl methacrylate) (PMMA) (25 nm) deposited on gold coated glass substrates have been locally modified by exposure to biased atomic force microscopy (AFM) tips. Constant exposure currents in the range of 0.5–0.65 nA leads to removal of PMMA both by direct ablation and enhanced s...

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Bibliographic Details
Published in:Surface science 2008-09, Vol.602 (18), p.3051-3056
Main Authors: Kongshaug, Kjell Ove, Steen, Helge
Format: Article
Language:English
Subjects:
Atomic force microscopy lithography
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Electrochemical phenomena
Exact sciences and technology
Physics
Poly(methyl methacrylate)
Thermal decomposition
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Description
Summary:Thin films of poly(methyl methacrylate) (PMMA) (25 nm) deposited on gold coated glass substrates have been locally modified by exposure to biased atomic force microscopy (AFM) tips. Constant exposure currents in the range of 0.5–0.65 nA leads to removal of PMMA both by direct ablation and enhanced solubility in a developer solution. Possible mechanisms causing such modifications have been discussed. Submicron Au structures were formed by combining AFM lithography, involving localized removal of PMMA, with sputter deposition of gold and a lift-off process.
ISSN:0039-6028
1879-2758
DOI:10.1016/j.susc.2008.08.006