Optical emission spectroscopy of DC pulsed plasmas used for steel nitriding

Optical emission spectroscopy of atomic lines and molecular vibrational bands in N 2, H 2/N 2 and Ar/N 2 plasmas at steel nitriding conditions have been reported as an application of this diagnostic to plasma nitriding. An increase in Ar I intensity as Ar percentage increases in an Ar/N 2 mixture is...

Full description

Saved in:
Bibliographic Details
Published in:Surface & coatings technology 2008-11, Vol.203 (3), p.229-233
Main Authors: Sharma, M.K., Saikia, B.K., Bujarbarua, S.
Format: Article
Language:English
Subjects:
Applied sciences
Atomic lines
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Heat treatment
Materials science
Metals. Metallurgy
Optical emission spectroscopy (OES)
Physics
Plasma nitriding
Production techniques
Spatial distribution
Steel nitriding
Surface treatments
Thermochemical treatment and diffusion treatment
Vibrational bands
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Optical emission spectroscopy of atomic lines and molecular vibrational bands in N 2, H 2/N 2 and Ar/N 2 plasmas at steel nitriding conditions have been reported as an application of this diagnostic to plasma nitriding. An increase in Ar I intensity as Ar percentage increases in an Ar/N 2 mixture is observed, while the effect on N 2 + emission has a decrease, just the reverse of Ar I emission profile. As electron energy distribution function, EEDF, shifted to high electron energy as Ar percentage increases in the mixture, the presence of high-energy electron at high gas temperature of discharge can be predicted. It has also been found that pressure effect on N 2 + band in pure nitrogen plasma is to increase the band intensities. Spatial distribution of N 2 +(0,1) and N 2 +(0,2) emission profile in N 2/H 2 mixture reveals shrinking of negative glow by 10 mm in the presence of 10% H 2 and 90% N 2 relative to a pure N 2 plasma.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2008.08.036