Effects of substrate bias frequencies on the characteristics of chromium nitride coatings deposited by pulsed DC reactive magnetron sputtering

Chromium nitride coatings have been used widely in industrial due to their good mechanical properties and corrosion resistance. In this work, the pure chromium nitride coatings were prepared by a bipolar symmetric pulsed DC reactive magnetron sputtering system at four different bias frequencies. It...

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Bibliographic Details
Published in:Surface & coatings technology 2008-12, Vol.203 (5), p.721-725
Main Authors: Lee, Jyh-Wei, Kuo, Yu-Chu, Wang, Chaur-Jeng, Chang, Li-Chun, Liu, Kuan-Ting
Format: Article
Language:English
Subjects:
Adhesion properties
Applied sciences
Chromium nitride
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Metallic coatings
Metals. Metallurgy
Nonmetallic coatings
Physics
Production techniques
Pulsed DC reactive magnetron sputtering system
Substrate bias current
Substrate bias frequency
Surface treatment
Surface treatments
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Summary:Chromium nitride coatings have been used widely in industrial due to their good mechanical properties and corrosion resistance. In this work, the pure chromium nitride coatings were prepared by a bipolar symmetric pulsed DC reactive magnetron sputtering system at four different bias frequencies. It is observed that the texture of CrN changed from (200) to (220) as substrate bias frequencies and bias current increased. It was concluded that the high substrate bias current showed strong detrimental effects on the microstructures, adhesion and wear properties of thin films. A pure CrN thin film with sufficient hardness, adhesion and wear resistance properties combinations was achieved as deposited at a substrate bias current lower than 0.394 A in this study.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2008.08.039